Abstract: A low-cost high-pressure cell to facilitate effective analysis of sample materials with high energy photon and electron beams. In one example, the cell includes a first micro-fabricated semiconductor substrate having a first membrane of a micro-fabricated material formed thereon and including a first membrane-covered region, and a second micro-fabricated semiconductor substrate having a second membrane of the micro-fabricated material formed thereon and including a second membrane-covered region, the first and second micro-fabricated semiconductor substrates being bonded together such that the first and second membrane-covered regions are at least partially aligned. The first and second membrane-covered regions may be separated by at least one spacer layer such that a cavity is formed between the membranes, the cavity being bounded on at least one side by one of membranes.

Abstract: A batch processing method for fabrication of diffractive optics is disclosed, having applicability to high resolution ultra-high aspect ratio Fresnel Zone Plates for focusing of X-rays or gamma-rays having energies up to hundreds of keV. An array of precursor forms comprising columns is etched into a planar substrate. After sidewall smoothing, a nanolaminate, comprising a sequence of alternating layers of different complex refractive index, is deposited on the sidewall of each column by atomic layer deposition (ALD), to define a specified diffractive line pattern around each column, to form a binary or higher order diffractive optic. After front surface planarization and thinning of the substrate to expose first and second surfaces of the diffractive line pattern of each diffractive optic, the height h in the propagation direction provides a designed absorption difference and/or phase shift difference between adjacent diffractive lines.

Abstract: A method for fabrication of diffractive optics by batch processing is disclosed, having applicability to high resolution ultra-high aspect ratio Fresnel Zone Plates for focusing of X-rays or gamma-rays having energies up to hundreds of keV. An array of precursor forms is etched into a planar substrate. Sidewalls of the forms are smoothed to a required surface roughness. A sequence of alternating layers of different complex refractive index, for binary or higher order diffractive optics, are deposited on the precursor forms by atomic layer deposition (ALD), to provide diffractive line patterns. Thinnest layers may have nanometer thicknesses. After front surface planarization and thinning of the substrate to expose first and second surfaces of the diffractive line patterns of the diffractive optic, the height h in the propagation direction provides a designed absorption difference and/or phase shift difference between adjacent diffractive lines.