Patents Assigned to ALD Nanosolutions Inc.
  • Continuous spatial atomic layer deposition process and apparatus for applying films on particles
    Patent number: 11773487
    Abstract: Continuous spatial atomic layer deposition is performed on a particulate substrate in a continuous reactor comprising a plurality of spatially separated, precursor dosing zones and a means for moving the particulate substrate spatially through the precursor dosing zones to apply an atomic layer deposition coating thereon. The precursor dosing zones may be used simultaneously.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: October 3, 2023
    Assignee: ALD NANOSOLUTIONS, INC.
    Inventors: Joseph Allen Spencer, II, Robert A Hall
  • Crystal microbalance holder
    Patent number: 8531090
    Abstract: A piezoelectric element holder allows a piezoelectric crystal to be mounted with a single exposed surface. This permits more accurate estimates of applied coating weights and thicknesses to be obtained. The piezoelectric element is mounted via a removable cap and malleable seal that permit the element to be removed and replaced easily.
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: September 10, 2013
    Assignee: ALD Nanosolutions Inc.
    Inventor: Joseph Allen Spencer, II