Abstract: A top coat nail polish composition, which is at least substantially free of ketones and aromatic solvents as well as formaldehyde containing resins and nitrocellulose, contains at least one cellulose ester, a mixture of aliphatic and cycloaliphatic solvents for the cellulose ester, a plasticizer for the cellulose ester, at least two UV blocking agents having different effective UV wavelength blockage ranges, a smoothing agent, an adhesion promoter, and an alkanol solvent for the smoothing agent and the adhesion promoter.

Abstract: A nail coating composition, which is substantially free to totally free of aromatic solvents, ketones, and formaldehyde containing resins, includes nitrocellulose, maleic modified rosin based resin, and polyester resin as the film forming polymers; sucrose acetate isobutyrate, butyl benzyl phthalate, and glyceryl tribenzoate as the plasticizers; at least one vitamin; at least one UV blocking agent; at least one protein; at least one moisturizer; at least one smoothing agent; at least one adhesion promoter; and a mixture of solvents, wherein all of the solvents in the composition are selected from the group consisting of alkanes having 4 to 10 carbon atoms, aliphatic esters having 3 to 10 carbon atoms, alkanols having 2 to 10 carbon atoms, cycloalkanes having 4 to 10 carbon atoms, cycloaliphatic esters having 4 to 10 carbon atoms, cycloalkanols having 4 to 10 carbon atoms, and mixtures of any two or more thereof.

Abstract: A top coat nail polish composition, which is at least substantially free of aromatic solvents, contains at least one cellulose ester, a mixture of aliphatic and cycloaliphatic solvents for the cellulose ester, a plasticizer for the cellulose ester, at least two UV blocking agents having different effective UV wavelength blockage ranges, a smoothing agent, an adhesion promoter, and an alkanol solvent for the smoothing agent and the adhesion promoter.