Patents Assigned to Altralight, Inc.
  • Patent number: 6149644
    Abstract: A method and apparatus for treating the epidermis with actinic light includes a solid state diode system with a continuous output. The light beam is generated by either a high power light emitting diode or a laser diode or a combination thereof. A computer controlled pattern generator (CCPG) directs the continuous light beam to trace predetermined patterns on a selected area of the skin. This integrated continuous light source and patterned treatment technique obviate the need for high peak power pulsed systems, while providing sufficient energy density at the target site to effect hair removal and other skin treatment modalities. The moving light beam has a computer controlled dwell time to generate a relatively high amount of energy in a short period of time at the target. The optimum dwell time is about 0.5 ms to 500 ms, and the wavelength is in the range of 600 nm to 990 nm. The spot size is in the range of 0.01 to 10.0 mm and the treatment area is in the range of 0.01 to 100 cm.sup.2.
    Type: Grant
    Filed: February 17, 1998
    Date of Patent: November 21, 2000
    Assignee: Altralight, Inc.
    Inventor: Ping Xie
  • Patent number: 6110195
    Abstract: A method and apparatus for surgical and dermatological treatment using a multi-wavelength laser system includes a primary laser beam generator optically pumped by a semiconductor laser diode. A portion or all of the optical pumping energy may be outputted with the primary laser beam output to form a multi-wavelength treatment beam. A frequency doubling medium, such as a KTP or LBO crystal, may be imposed in the output of the laser beam generator to produce an additional wavelength that may be combined into the multi-wavelength treatment beam. To achieve high peak power pulse laser output, a Q-switch element can be placed in front or in back of the laser crystal. Alternatively, the laser system may output only the wavelength of the semiconductor laser diode pumping system. The selection of one or more wavelengths provides a wider range of treatment modalities using a single laser system, without creating problems attendant with the complexity and maintenance of prior art multi-wavelength laser systems.
    Type: Grant
    Filed: June 1, 1998
    Date of Patent: August 29, 2000
    Assignee: Altralight, Inc.
    Inventors: Ping Xie, Honghua Qiu