Abstract: Methods, burner, apparatuses, and systems are provided for controlling a velocity of a jet of gas exiting a burner when the gas is heated or not and at a corresponding second higher temperature or lower first temperature. Through the use of a temperature-sensitive magnetic valve, the flow of a gas can be redirected to maintain velocity of the gas as delivered to a combustion chamber based on the temperature of the gas. The temperature-sensitive magnetic valve can redirect flow of the gas based on the magnetic state of a ferromagnetic material. The state of the temperature-sensitive magnetic valve changes based on the temperature of the gas to maintain the velocity of the gas delivered through an outlet of the burner to the combustion chamber. Thus, heated gases and standard temperature gases can be delivered at approximately equal velocities thus maintaining flame size and shape.
Type:
Grant
Filed:
January 5, 2017
Date of Patent:
March 5, 2019
Assignee:
American Air Liquide, Inc.
Inventors:
Taekyu Kang, Robert Sokola, Vijaykant Sadasivuni, Hwanho Kim
Abstract: Silicon nitride plasma etching processes are disclosed that minimize the SiN roughness layer on a substrate having a SiN layer thereon by simultaneously introducing an oxidizer at a predetermined flow rate and an etch gas into a plasma reaction chamber containing the substrate. The etch gas has the formula CxHyFz, wherein x is 2-5, z is 1 or 2, 2x+2=y+z, and a fluorine atom is located on a terminal carbon atom of the etch gas.
Type:
Grant
Filed:
April 23, 2015
Date of Patent:
February 26, 2019
Assignee:
American Air Liquide, Inc.
Inventors:
James Royer, Venkateswara R. Pallem, Rahul Gupta
Abstract: A radiative recuperator preheats oxidant and/or fuel for combustion at one or more burners of a furnace. The recuperator includes a duct, at least portions of which comprise a material having a thermal conductivity of greater than 1 W/(m·K), preferably greater than 3 W/(m·K), that receives hot flue gas produced by the burner(s). The duct radiatively transfers heat to oxidant or fuel (for preheating) flowing through one or more metallic pipes disposed in between the duct and an insulating wall.
Type:
Application
Filed:
April 6, 2018
Publication date:
January 3, 2019
Applicants:
American Air Liquide, Inc., L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
Inventors:
Taekyu KANG, James J.F. MCANDREW, Remi TSIAVA, Jiefu MA, Ryan ADELMAN, Henri CHEVREL
Abstract: Disclosed are sulfur-containing compounds for plasma etching channel holes, gate trenches, staircase contacts, capacitor holes, contact holes, etc., in Si-containing layers on a substrate and plasma etching methods of using the same. The plasma etching compounds may provide improved selectivity between the Si-containing layers and mask material, less damage to channel region, a straight vertical profile, and reduced bowing in pattern high aspect ratio structures.
Type:
Grant
Filed:
August 24, 2017
Date of Patent:
October 30, 2018
Assignees:
L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, American Air Liquide, Inc.
Abstract: Replacement chemistries for the cC4F8 passivation gas in the Bosch etch process and processes for using the same are disclosed. These chemistries have the formula CxHyFz, with 1?x<7, 1?y?13, and 1?z?13. The replacement chemistries may reduce RIE lag associated with deep silicon aperture etching.
Type:
Grant
Filed:
September 8, 2017
Date of Patent:
October 16, 2018
Assignees:
L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Georges Claude, American Air Liquide, Inc., Air Liquide Electronics U.S. LP
Inventors:
Peng Shen, Christian Dussarrat, Curtis Anderson, Rahul Gupta, Vincent M. Omarjee, Nathan Stafford
Abstract: Methods of using Si-containing film forming compositions to deposit silicon-containing films using vapor deposition processes are disclosed. The disclosed Si-containing film forming composition comprises an amino(bromo)silane precursor having the formula: SiHxBry(NR1R2)4?x?y wherein x=0, 1 or 2; y=1, 2 or 3; x+y<4; each R1 and R2 is independently selected from C1-C6 alkyl, aryl, or hetero group; and R1 and R2 may be joined to form a cyclic nitrogen-containing heterocycle. The disclosed Si-containing film forming compositions include an amino(bromo)silane precursor selected from the group consisting of SiH2Br(NEt2), SiH2Br(N(iPr)2), SiH2Br(N(iBu)2) and SiBr(NMe2)3.
Type:
Grant
Filed:
December 30, 2015
Date of Patent:
August 21, 2018
Assignees:
L'Air Liquide, Societé Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, American Air Liquide, Inc.
Inventors:
Glenn Kuchenbeiser, Venkateswara R. Pallem, Nicolas Blasco, Jean-Marc Girard
Abstract: Disclosed are methods for operating a glass furnace, the method comprises the steps of feeding a non-pre-reformed hydrocarbon fuel gas stream to a pre-reformer forming a pre-reformed hydrocarbon fuel gas stream, feeding the pre-reformed hydrocarbon fuel gas stream to burners of the furnace, combusting oxidant and the pre-reformed hydrocarbon fuel gas with the burners to produce flue gas, heating air through heat exchange with the flue gas at a recuperator, and transferring heat from heated air to pre-reformer tubes of the pre-reformer. A glass furnace system is also disclosed.
Type:
Application
Filed:
January 27, 2017
Publication date:
August 2, 2018
Applicant:
American Air Liquide, Inc.
Inventors:
Taekyu KANG, Robert A. GAGLIANO, Pavol PRANDA, Ashkan IRANSHAHI
Abstract: Disclosed are Si-containing film forming composition comprising organodisilane precursors. The organodisilane precursors have the formula (E-(CR)n-E)SiH2—SiHx(E-(CR)n-E)3-x, wherein x is 2 or 3; each n is independently 1 or 3; each (E-(CR)n-E) group is a monoanionic bidentate ligand bonding to the Si through each E; each E is independently chosen from NR, O or S; and each R is independently selected from the group consisting of H, a C1 to C6 alkyl group, and a C3-C20 aryl or heterocycle group. Also disclosed are methods of synthesizing the Si-containing film forming compositions and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics.
Type:
Grant
Filed:
October 2, 2015
Date of Patent:
June 26, 2018
Assignee:
American Air Liquide, Inc.
Inventors:
Guillaume Husson, Glenn Kuchenbeiser, Venkateswara R. Pallem
Abstract: Disclosed are Si-containing film forming compositions comprising carbosilane substituted amine precursors. The carbosilane substituted amine precursors have the formula (R1)aN(—SiHR2—CH2—SiH2R3)3?a, wherein a=0 or 1; R1 is H, a C1 to C6 alkyl group, or a halogen; R2 and R3 is each independently H; a halogen; an alkoxy group having the formula OR?, wherein R? is an alkyl group (C1 to C6); or an alkylamino group having the formula NR?2, wherein each R? is independently H, a C1-C6 alkyl group, a C1-C6 alkenyl group, or a C3-C10 aryl or heterocycle group. Also disclosed are methods of synthesizing the carbosilane substituted amine precursors and their use for deposition processes.
Type:
Grant
Filed:
September 23, 2015
Date of Patent:
May 15, 2018
Assignees:
L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés George Claude, American Air Liquide, Inc.
Inventors:
Claudia Fafard, Venkateswara R. Pallem, Jean-Marc Girard
Abstract: Disclosed are Si-containing thin film forming precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics.
Type:
Grant
Filed:
July 19, 2013
Date of Patent:
April 10, 2018
Assignee:
American Air Liquide, Inc.
Inventors:
Christian Dussarrat, Glenn Kuchenbeiser, Venkateswara R. Pallem
Abstract: Replacement chemistries for the cC4F8 passivation gas in the Bosch etch process and processes for using the same are disclosed. These chemistries have the formula CxHyFz, with 1 ?x<7, 1?y?13, and 1?z?13. The replacement chemistries may reduce RIE lag associated with deep silicon aperture etching.
Type:
Grant
Filed:
June 17, 2015
Date of Patent:
February 13, 2018
Assignees:
L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, American Air Liquide, Inc., Air Liquide Electronics U.S. LP
Inventors:
Peng Shen, Christian Dussarrat, Curtis Anderson, Rahul Gupta, Vincent M. Omarjee, Nathan Stafford
Abstract: Temperature overshoot of internal components of a counter-flow shell and tube heat heat exchange may be reduced or avoided by adjusting the degree to which a tube-side fluid partially bypasses the heat exchanger.
Abstract: Disclosed are hexacoordinate silicon-containing precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel type devices, refractory materials, or aeronautics. The hexacoordinate silicon-containing molecule have the following formula: (I), wherein each L1, L2, L3 and L4 is independently selected from oxygen or nitrogen atoms; L1 and L2 are joined together via a carbon bridge having one to three carbon atoms; L3 and L4 are joined together via a carbon bridge having one to three carbon atoms; L1, L2 and the carbon bridge forming a monoanionic ligand bonded to silicon; and L3, L4 and the carbon bridge form a monoanionic ligand bonded to silicon.
Type:
Grant
Filed:
July 18, 2014
Date of Patent:
November 21, 2017
Assignees:
American Air Liquide, Inc., L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
Inventors:
Glenn Kuchenbeiser, Christian Dussarrat, Venkateswara R. Pallem
Abstract: A cylinder transport and mounting system is provided. This system includes a object mounting yoke, and at least one bracket selected from the group consisting of a conveyance mounting bracket, and user mounting bracket, wherein the cylinder mounting yoke is configured to attach securely to a cylinder and to detachably interface with the conveyance mounting bracket and/or to detachably interface with the user mounting bracket.
Type:
Grant
Filed:
July 27, 2016
Date of Patent:
October 10, 2017
Assignee:
American Air Liquide, Inc.
Inventors:
Monaca McNall, Scott Liedel, Robert Sokola, Bryan R. Hotaling, John A. MacNeill, James M. Ormond, James R. Varney
Abstract: Disclosed are amino(iodo)silane precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes. The disclosed amino(iodo)silane precursors include SiH2I(N(iPr)2) or SiH2I(N(iBu)2).
Abstract: Disclosed are sulfur-containing compounds for plasma etching channel holes, gate trenches, staircase contacts, capacitor holes, contact holes, etc., in Si-containing layers on a substrate and plasma etching methods of using the same. The plasma etching compounds may provide improved selectivity between the Si-containing layers and mask material, less damage to channel region, a straight vertical profile, and reduced bowing in pattern high aspect ratio structures.
Abstract: Atomic layer or cyclic plasma etching chemistries and processes to etch films are disclosed. Films include Si, Ti, Ta, W, Al, Pd, Ir, Co, Fe, B, Cu, Ni, Pt, Ru, Mn, Mg, Cr, Au, alloys thereof, oxides thereof, nitrides thereof, and combinations thereof.
Type:
Grant
Filed:
June 4, 2015
Date of Patent:
September 26, 2017
Assignee:
American Air Liquide, Inc.
Inventors:
Rahul Gupta, Venkateswara R. Pallem, Benjamin J. Jurcik, Jr.
Abstract: The invention may be broadly defined as the addition of Argon to FFPE procedures as an RNA stabilizing agent. Argon is an inert gas from the Noble gas group with low saturation concentrations in water. It is therefore highly surprising that Argon would have any effect on RNA stability in the presence of Formalin, or any other chemical. This property of Argon appears to be specific in that other inert gases fail to show any RNA stabilizing effect.
Type:
Grant
Filed:
August 16, 2013
Date of Patent:
July 25, 2017
Assignees:
American Air Liquide, Inc., The United States of America, as represented by the Secretary, Department of Health and Human Services
Inventors:
Vasuhi Rasanayagam, Sagar D. Joshi, Meenakshi Sundaram, Stephen M. Hewitt, Joon-Yong Chung
Abstract: Methods and compositions for depositing rare earth metal-containing layers are described herein. In general, the disclosed methods deposit the precursor compounds comprising rare earth-containing compounds using deposition methods such as chemical vapor deposition or atomic layer deposition. The disclosed precursor compounds include a cyclopentadienyl ligand having at least one aliphatic group as a substituent and an amidine ligand.
Type:
Grant
Filed:
June 9, 2016
Date of Patent:
July 18, 2017
Assignee:
American Air Liquide, Inc.
Inventors:
Venkateswara R. Pallem, Christian Dussarrat, Wontae Noh
Abstract: Disclosed are methods of synthesizing an amino(halo)silane comprising the step of reacting a halosilane having the formula SiaHbXc with an aminosilane having the formula SidHe(NR1R2)f to produce the amino(halo)silane having the formula SiwHxXy(NR1R2)z, wherein X=Br or I; each R1 and R2 is independently selected from a C1-C10 alkyl, aryl, or hetero group; a, d, and w independently=1 to 4; b+c=2a+2; b=1 to 2a+1; c=1 to 2a+1; e+f=2d+2; e=1 to 2d+1; f=1 to 2d+1; x+y+z=2w+2; and R1 and R2 may be joined to form a nitrogen-containing heterocycle.
Type:
Grant
Filed:
December 30, 2015
Date of Patent:
July 11, 2017
Assignee:
American Air Liquide, Inc.
Inventors:
Glenn Kuchenbeiser, Venkateswara R. Pallem, Guillaume Husson