Patents Assigned to AMETEK Finland Oy
  • Publication number: 20230386694
    Abstract: A method is for manufacturing a radiation window for an X-ray measurement apparatus. The method includes producing an etch stop layer on a surface of a carrier and producing a foil structure on a side of the etch stop layer opposite the carrier. A combined structure with the etch stop layer and the foil structure is attached to a region around an opening in a housing of the X-ray measurement apparatus with the foil structure facing the housing so that an edge strengthening structure is arranged between the combined structure and an edge region around the opening in the housing or partly inside the foil structure. At least part of the carrier is detached before attaching the combined structure or detaching at least part of the carrier after attaching the combined structure, wherein the combined structure includes the carrier. A radiation window is for an X-ray measurement apparatus.
    Type: Application
    Filed: May 23, 2023
    Publication date: November 30, 2023
    Applicant: AMETEK FINLAND OY
    Inventors: Pekka TÖRMÄ, Esa KOSTAMO, Jari KOSTAMO, Tapio LANTELA
  • Patent number: 11469086
    Abstract: A method is for manufacturing a multilayer radiation window for an X-ray measurement apparatus. The method includes: producing a gas diffusion stop layer made of silicon nitride on a polished surface of a carrier; producing at least one combined layer on an opposite side of the gas diffusion stop layer than the carrier; attaching the combined structure including the carrier, the gas diffusion stop layer, the at least one combined layer to a region around an opening in a support structure with the at least one combined layer facing the support structure; and etching away the carrier. The at least one combined layer includes: a light attenuation layer made of aluminium, and a strengthening layer. A radiation window is manufactured with the method.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: October 11, 2022
    Assignee: AMETEK Finland Oy
    Inventors: Jari Kostamo, Heikki Sipilä
  • Publication number: 20210233752
    Abstract: The invention relates to a method for manufacturing a multilayer radiation window for an X-ray measurement apparatus. The method comprises: producing a gas diffusion stop layer made of silicon nitride on a polished surface of a carrier; producing at least one combined layer on an opposite side of said gas diffusion stop layer than said carrier; attaching the combined structure comprising said carrier, said gas diffusion stop layer, said at least one combined layer to a region around an opening in a support structure with the at least one combined layer facing said support structure; and etching away said carrier. The at least one combined layer comprises: a light attenuation layer made of aluminium, and a strengthening layer. The invention relates also a radiation window manufactured with the method.
    Type: Application
    Filed: May 8, 2018
    Publication date: July 29, 2021
    Applicant: AMETEK Finland Oy
    Inventors: Jari KOSTAMO, Heikki SIPILÄ