Patents Assigned to Amethyst Research, Inc.
  • Patent number: 9196497
    Abstract: An apparatus and method for hydrogenating a sample, such as a semiconductor wafer. The invention utilizes a top electrode comprising a UV-transparent dielectric and a metal contact to provide an electric field to the sample while the sample is irradiated with UV light and hydrogenated with a hydrogenating gas or gasses. The field may be applied to the sample at a number of different pressures, temperatures and concentrations of gas to manipulate the rate and type of hydrogenation. Further, the method of hydrogenating the sample may be used in conjunction with masking and etching techniques.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: November 24, 2015
    Assignee: Amethyst Research, Inc.
    Inventors: Orin W. Holland, Ryan J. Cottier, Terry D. Golding, Khalid Hossain, Ronald Paul Hellmer
  • Publication number: 20120009769
    Abstract: The invention is directed to ion implantation. Ion implantation is a process whereby energetic ions are used to uniformly irradiate the surface of a material—typically a semiconductor wafer. Either atomic or molecular ions are created in an ion source and then extracted for analysis (e.g. by magnetic separation) to ensure the purity of the ion beam. Post-analysis acceleration and scanning of the beam is done prior to sample irradiation. Each dopant-type acts, in general, to increase the conductivity of the silicon.
    Type: Application
    Filed: July 6, 2011
    Publication date: January 12, 2012
    Applicant: Amethyst Research, Inc.
    Inventors: Orin W. Holland, Khalid Hossain
  • Publication number: 20110297534
    Abstract: An apparatus and method for hydrogenating a sample, such as a semiconductor wafer. The invention utilizes a top electrode comprising a UV-transparent dielectric and a metal contact to provide an electric field to the sample while the sample is irradiated with UV light and hydrogenated with a hydrogenating gas or gasses. The field may be applied to the sample at a number of different pressures, temperatures and concentrations of gas to manipulate the rate and type of hydrogenation. Further, the method of hydrogenating the sample may be used in conjunction with masking and etching techniques.
    Type: Application
    Filed: June 8, 2011
    Publication date: December 8, 2011
    Applicant: Amethyst Research, Inc.
    Inventors: Orin W. Holland, Ryan J. Cottier, Terry D. Golding, Khalid Hossain, Ronald Paul Hellmer
  • Publication number: 20110070143
    Abstract: An apparatus and method for improving the electrical conductivity of a thermoelectric material, particularly a material comprising polysilicon nanowires. The method comprises hydrogenation of the device to improve the electrical conductivity of the device with negligible change to the thermal conductivity. Hydrogenation of the thermoelectric device may be accomplished using several techniques, including UV-assisted hydrogenation in a vacuum chamber.
    Type: Application
    Filed: September 21, 2010
    Publication date: March 24, 2011
    Applicant: Amethyst Research, Inc.
    Inventors: Ronald Paul Hellmer, Terry D. Golding
  • Patent number: 7888251
    Abstract: Apparatus and method are provided for hydrogenating semiconductor or other materials by ultraviolet (UV) radiation in the presence of hydrogen. Hydrogen uptake may be optimized by selection of temperature and wavelength of the UV radiation. Patterned areas may be selectively hydrogenated, such as mesas in Avalanche Photodiode Arrays.
    Type: Grant
    Filed: April 19, 2007
    Date of Patent: February 15, 2011
    Assignee: Amethyst Research, Inc.
    Inventors: Terry D. Golding, Ronald Paul Hellmer
  • Publication number: 20100327276
    Abstract: Apparatus and method to improve the operating parameters of HgCdTe-based optoelectric devices by the addition of hydrogen to passivate dislocation defects. A chamber and a UV light source are provided. The UV light source is configured to provide UV radiation within the chamber. The optoelectric device, which may comprise a HgCdTe semiconductor, is placed into the chamber and may be held in position by a sample holder. Hydrogen gas is introduced into the chamber. The material is irradiated within the chamber by the UV light source with the device and hydrogen gas present within the chamber to cause absorption of the hydrogen into the material.
    Type: Application
    Filed: July 7, 2010
    Publication date: December 30, 2010
    Applicant: Amethyst Research, Inc
    Inventors: Orin W. Holland, Terry D. Golding, John H. Dinan, Ronald Paul Hellmer
  • Publication number: 20090309623
    Abstract: A method is provided for measuring defects in semiconductor materials. In one embodiment the method includes placing deuterium in the material and directing an ion beam onto the material to cause a nuclear reaction with the deuterium. Products of the nuclear reaction are analyzed (NRA) to measure the concentration of defects. In other embodiments, a spectroscopic technique is used to detect the deuterium taggant. Lattice defect or total defect occurrences can be selected by selecting the method of placing deuterium in the sample. Defect concentration vs. depth below the surface of material can be determined by varying the energy of the ion beam or by measuring energy profiles of products of the nuclear reaction. The method may be applied to wafers, pixels or other forms of semiconductor materials and may be combined with X-ray analysis of elements on the material.
    Type: Application
    Filed: June 11, 2008
    Publication date: December 17, 2009
    Applicant: Amethyst Research, Inc.
    Inventors: Orin W. Holland, Terry D. Golding, Ronald P. Hellmer, Thomas H. Myers