Patents Assigned to Analyze Inc.
  • Alkaline organic photoresist stripper
    Patent number: 5962197
    Abstract: A stripper for removing photoresist or solder masks has a composition of 30-80% by weight of a propylene glycol ether; 10-60% by weight of a pyrrolidone; 0.1-5% by weight of potassium hydroxide; 0.1-10% by weight of a surfactant; 0-20% by weight 1,3-butanediol; 0-10% by weight 2-(2-aminoethoxy) ethanol; and a water content of <1%.
    Type: Grant
    Filed: March 27, 1998
    Date of Patent: October 5, 1999
    Assignee: Analyze Inc.
    Inventor: Zhao Chen