Abstract: A process for the cleaning of carbon nanostructure and similar materials and structures for removal of surfactant chemicals. The process includes washing the carbon nanostructures with concentrated acetic acid which may be glacial acetic acid. The cleaning process is also considered in carbon nanostructure film preparation with deposition of carbon nanostructures in solution with surfactant chemicals before the washing. Possible surfactants include sodium cholate (SC) and sodium dodecyl sulfate (SDS). Carbon nanostructure deposition on a substrate may be by various printing methods.