Patents Assigned to Anerkan Xtal Technology, Inc
  • Single crystal wafers and a method of preparation thereof
    Patent number: 5962915
    Abstract: Improved commercial single crystal wafers (250), as shipped to end users form a full circle, and comprise a "stress concentration notch" (172) which accurately defines a desired cleavage plane. The stress concentration notch is introduced into the wafers in bulk by means of a properly oriented cut along the length of a single crystal ingot, after machining the ingot to the desired end product diameter, and prior to sawing the ingot into slices. The stress concentration notch uniquely defines the first and second faces of the wafer.
    Type: Grant
    Filed: October 14, 1997
    Date of Patent: October 5, 1999
    Assignee: Anerkan Xtal Technology, Inc
    Inventors: Gary Shen-Cheng Young, Shan-Xiang Zhang