Abstract: A coating of a target material is applied onto a substrate by placing the substrate in a chamber and energizing cathodes in the chamber to produce a plasma. Each cathode comprises a target material and is positioned in the same side of the chamber relative to the substrate. The plasma circulates in the chamber. An acid-resistant metal film can be made from an acid-soluble metal by applying the metal onto an acid-resistant substrate as described herein. A cathodic vapor deposition apparatus includes a chamber having a wall, including a wall comprising an access door. There are cathodes on the wall, a pump operatively connected to the chamber, and a fixture in the chamber. The fixture is electrically isolated from the chamber and the cathodes are all on the same side of the fixture.