Patents Assigned to Anon, Incorporated
  • Method of forming patterns in organic coatings films and layers
    Patent number: 5763016
    Abstract: Water-free, gaseous sulfur trioxide is used as an agent to form patterns in organic coatings, films, and layers, including photoresists, by etching areas exposed to the agent through an overlying mask or by developing a latent image of the desired pattern using the agent as a dry-developer.
    Type: Grant
    Filed: December 19, 1996
    Date of Patent: June 9, 1998
    Assignee: Anon, Incorporated
    Inventors: Eric O. Levenson, Ahmad Waleh