Patents Assigned to Anvik Corporation
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Patent number: 6149856Abstract: In making thermoset and photo-set polymer-matrix composite parts, curing is the key process step that transforms the molecular structure of the composite material, stabilizing it in the desired shape. This curing system applies carefully controlled ultraviolet (UV) radiation dosages, appropriately distributed over the entire surface of the composite part, thereby rapidly curing the material while enabling direct monitoring and control of the curing energy. Previous photo-curing methods have applied generalized radiation to a part with conventional UV lamps. We provide great benefits in cure depth, speed and process control by precisely controlling all parameters of UV dosage, by computed control, by markings on the part, or by dynamic feedback control from embedded sensors or non-contact sensors. This system can apply greater radiation dose to areas of increased quantities of resin, such as support ribs, and lesser radiation dose to areas of decreased quantities of resin.Type: GrantFiled: November 13, 1998Date of Patent: November 21, 2000Assignee: Anvik CorporationInventors: Marc I. Zemel, Thomas J. Dunn
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Patent number: 6142638Abstract: This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors.Type: GrantFiled: September 23, 1999Date of Patent: November 7, 2000Assignee: Anvik CorporationInventors: Marc Zemel, Carl C Kling, Kanti Jain, Nestor O Farmiga
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Patent number: 6142639Abstract: This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors.Type: GrantFiled: September 23, 1999Date of Patent: November 7, 2000Assignee: Anvik CorporationInventors: Kanti Jain, Carl C Kling
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Patent number: 6094306Abstract: An energy saving window system operates selectively in different seasons and climatic conditions to optimize transfer of the sun's radiation through the window into an interior space. Two sets of diffraction gratings are deployed, with two mode settings--a summer or capture mode and a winter or transmittance mode. In the summer mode, transfer of heat into the interior is undesirable. Unwanted heat rays are redirected to a scupper by additive diffraction through two diffraction gratings in series. The scupper redirects the undesired radiation to a heat sink or back out through the window. In the winter mode, transfer of heat into the interior is desirable. By repositioning the two diffraction gratings so that their deflections are subtractive, the sun's rays are redirected to be essentially undiffracted so as to miss the scupper and enter the room. The essentially undiffracted light rays are acceptable as a view and are effectively unblocked as to solar heat gain.Type: GrantFiled: April 13, 1993Date of Patent: July 25, 2000Assignee: Anvik CorporationInventor: Kanti Jain
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Patent number: 6018383Abstract: In the manufacturing of flexible, large-area electronic modules such as flat-panel displays (FPDs), the high cost and low yields of currently available patterning equipment represent a significant barrier to cost-effective production. This invention provides a projection imaging system that can pattern very large, flexible substrates at very high exposure speeds with almost any desired image resolution. The master pattern to be imprinted on the substrate is contained on a mask which, similar to the substrate, is made of a flexible material The mask and substrate are scanned by rollers through the object and the image field, respectively, of a 1:1 projection lens. All of the rollers are driven by identical drive systems linked to a common motor; therefore, the scanning of the mask and substrate is perfectly synchronized. Both the mask and the substrate, along with their rollers, are mounted on a linear translation stage.Type: GrantFiled: August 20, 1997Date of Patent: January 25, 2000Assignee: Anvik CorporationInventors: Thomas J. Dunn, Nestor O. Farmiga, Marc Zemel, Carl Weisbecker, Kanti Jain
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Patent number: 6014845Abstract: An energy saving skylight cover system operates selectively in summer and winter to optimize transfer of the sun's radiation through the skylight into an interior space. The skylight cover system comprises optical transmission modifying panels and radiation scuppers that make its functional characteristics responsive to the sun's incidence angle. In summer mode, with high average inclination of the sun, the skylight cover system absorbs or reflects back the undesirable solar heat. In winter mode, the skylight cover system permits majority of the sun's rays to enter the interior space, permitting desirable solar heat gain. The determination of rejecting or accepting solar heat gain is made by the skylight cover system according to a designed-in characteristic angle. The characteristic angle is a function of the orientation of the skylight and the roof, and the geographical location of the building.Type: GrantFiled: May 24, 1993Date of Patent: January 18, 2000Assignee: Anvik CorporationInventors: Kanti Jain, Carl C. Kling
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Patent number: 5969870Abstract: This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors.Type: GrantFiled: September 18, 1997Date of Patent: October 19, 1999Assignee: Anvik CorporationInventors: Kanti Jain, Marc Zemel, Teik-Meng Lee, Nestor O. Farmiga, Carl C. Kling
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Patent number: 5933216Abstract: A high-performance projection optical system uses the multiple spectral peaks of an excimer laser system by using an optical dispersive system to physically separate the broadband laser output into separate narrowband beams which can be used for imaging different substrate surfaces simultaneously. The separated narrowband beams are directed along different optical paths and used to illuminate the object planes of different, identical projection lenses. The projection lenses are designed for the narrowed bandwidth corresponding to one spectral peak of the excimer laser rather than the broadband, multiple-peak laser output This dramatically simplifies both the design and the construction of the projection lens, leading to substantial cost-savings.Type: GrantFiled: October 16, 1997Date of Patent: August 3, 1999Assignee: Anvik CorporationInventor: Thomas J. Dunn
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Patent number: 5923403Abstract: This projection imaging system is capable of simultaneously exposing both the upper and lower sides of a substrate while providing high-resolution, a large exposure area, and high exposure throughput.Type: GrantFiled: July 8, 1997Date of Patent: July 13, 1999Assignee: Anvik CorporationInventor: Kanti Jain
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Patent number: 5897986Abstract: A large-format substrate patterning system, for microelectronics manufacturing, utilizes a substrate docking fixture to enable relative motion between the substrate stage and the substrate. This enables exposure of a large-format substrate which has been partitioned into different modules where each module contains an entire pattern transferred from a mask. This projection system enables patterning of a large multi-module substrate using a stage whose range of travel is smaller than the size of the substrate and using a mask whose area is smaller than the size of the substrate. This is accomplished by repositioning the substrate to expose each module sequentially. In order to reposition the substrate, its location is maintained fixed in space by a substrate docking fixture while the movable stage of the lithography system is repositioned to position a different module of the substrate in the image field of the lithography tool.Type: GrantFiled: May 28, 1997Date of Patent: April 27, 1999Assignee: Anvik CorporationInventors: Thomas J. Dunn, Nestor O. Farmiga, Kanti Jain
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Patent number: 5828505Abstract: An internally-mirrored tube of constant cross-section, for use as a beam-shaper-uniformizer in an optical lithography tool, requires precision assembly, closely approaching total internal reflection, to be able to accept at the entry end a beam of laser light of specified numerical aperture, having an arbitrary cross-section and a non-uniform intensity profile, and deliver at the exit a beam having the same numerical aperture, the desired cross-sectional shape, and a substantially uniform intensity profile across the illuminated area. Imperfections at the edges of the component slabs would interfere with operation. The difficulty of machining internal surfaces to mirror smoothness, and the difficulty of applying mirror finishes to internal surfaces, suggests that the uniformizer be assembled from mirrored slabs cemented together. Achieving precision without breakage or scuffing of mirrors is difficult.Type: GrantFiled: May 10, 1996Date of Patent: October 27, 1998Assignee: Anvik CorporationInventor: Nestor O. Farmiga
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Patent number: 5825558Abstract: A three-dimensional Universal Mounting Component (UMC) system of UMC blocks provides general mounting for use in optical research in constructing layouts for experiments and breadboard-type prototypes. In such optical layouts laser beams or other light beams are directed about complex paths, often on several planes or levels. Use of the invention overcomes the problem of creating three-dimensional optical layouts with less standardized, and much more expensive, mounting adapters and posts. An economical, standardized set of UMC blocks, each with a number of holes in grid configurations, enables users to construct custom three-dimensional optical layouts. Each UMC block is a right rectangular solid of substantial standardized thickness sufficient to support it on edge. Each UMC block has a set of smooth counterbored holes from front to back and has another set of such holes from back to front.Type: GrantFiled: August 6, 1996Date of Patent: October 20, 1998Assignee: Anvik CorporationInventors: Nestor O. Farmiga, Kanti Jain
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Patent number: 5710619Abstract: In numerous applications of large-area patterning systems, the preferred image magnification is unity. However, in some applications, the size of the substrate may change slightly due to various thermal and/or chemical processing steps. To compensate for scale changes of the substrate, the magnification of the imaging system must vary slightly from unit magnification (typically by a fraction of a percentage) so that a layer already patterned on the substrate will have, after processing, proper image registration with the subsequent layer.This disclosure describes a lithography system for exposing large substrates at high imaging resolution and high exposure throughput, and specifically relates to a scan-and-repeat patterning system that employs a unitary mask-substrate stage and enables projection imaging of a substrate with capability to control the image magnification to compensate for changes of substrate dimensions occurring as a result of previous process steps.Type: GrantFiled: October 31, 1995Date of Patent: January 20, 1998Assignee: Anvik CorporationInventors: Kanti Jain, Jeffrey M. Hoffman
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Patent number: 5696631Abstract: A unit magnification lens system suitable for imaging of features in photoresist designed for exposure at a wavelength of 248.4 nm using a krypton fluoride excimer laser. This lens system is characterized by a very long working distance in the object and image spaces to allow incorporation of minors in the imaging path. The optical system is refractive, telecentric, and symmetrical about the central aperture stop.Type: GrantFiled: February 22, 1996Date of Patent: December 9, 1997Assignee: Anvik CorporationInventor: Jeffrey M. Hoffman
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Patent number: 5652645Abstract: A projection imaging system is described for patterning large, flexible substrates at high exposure speeds and desired resolution, the substrates being in the form of a continuous band fed from a roller for cost-effective electronic module manufacturing. From the continuous band, segments of one panel size are sequentially exposed one at a time. The segment being exposed is held rigidly on a scanning stage, on which is also mounted a mask containing the pattern to be formed on the substrate. The imaging subsystem is stationary and situated above the scanning stage. The mask is illuminated with a hexagonal illumination beam and a region of similar shape is imaged on the substrate. The stage is programmed to scan the mask and substrate simultaneously across the hexagonal regions so as to pattern one whole panel.Type: GrantFiled: July 24, 1995Date of Patent: July 29, 1997Assignee: Anvik CorporationInventor: Kanti Jain
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Patent number: 5565987Abstract: This invention describes a surface profilometry system which measures the surface topography of a sample on a sub-nanometer scale. The surface profile is determined through measurement of the change in distance between two mirrors of a multi-pass resonant cavity that is referenced to a frequency stabilized laser source. The contact stylus is in contact with the sample as it is translated along the plane to be measured. As the stylus traverses the sample, it is vertically deflected and transfers the motion directly to one of the mirrors of a multi-pass resonant cavity. The cavity is referenced to a frequency stabilized laser source that is synchronized with the resonant modes of the multi-pass cavity. Very small sub-nanometer deviations of the cavity can be detected by monitoring the laser beam incident on the multi-pass cavity. There are two embodiments by which the cavity length changes can be measured.Type: GrantFiled: March 23, 1995Date of Patent: October 15, 1996Assignee: Anvik CorporationInventors: Kanti Jain, Subhash Chandra, Carl C. Kling
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Patent number: 5555089Abstract: The absolute distance measuring interferometer (ADMI) is a multi-pass interferometer which is a resonant cavity consisting of two plane parallel mirrors whose length is referenced to a stabilized laser system. The resonant cavity can be used in order to measure very precisely (to within a fraction of a wavelength) the distance between a reference plane and an object. Due to its multi-pass nature, the length of the cavity can be measured much more accurately than for a conventional interferometer. The optical transmission bandwidth of the resonant cavity is inversely proportional to its length. A direct measure of the transmission bandwidth provides an extremely precise (to within a fraction of a wavelength) absolute measure of the length of the cavity. This eliminates the need for careful alignment during the motion of one of the mirrors of the multi-pass interferometer.Type: GrantFiled: November 30, 1994Date of Patent: September 10, 1996Assignee: Anvik CorporationInventors: Thomas J. Dunn, Dharmesh G. Panchal
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Patent number: 5502563Abstract: A Fabry-Perot resonator, also called a Fabry-Perot cavity, is a spectroscopic device of extremely high resolving power and is a very useful tool for alignment of mask and wafer for the multiple exposures necessary to make a semiconductor integrated circuit. When a Fabry-Perot cavity is used for alignment in a multi-exposure imaging procedure, the cavity itself must be very accurately aligned for each exposure. For proper alignment system operation, it is necessary that one of the mirrors of the resonant cavity be fixed with respect to the mask, and the other mirror be fixed with respect to the wafer. This invention provides a mechanical system and method to maintain the alignment of a Fabry-Perot cavity for each exposure. This invention describes a technique in which the Fabry-Perot cavity is transported from one exposure area to the next without need for realignment.Type: GrantFiled: October 21, 1994Date of Patent: March 26, 1996Assignee: Anvik CorporationInventors: Thomas J. Dunn, Kanti Jain
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Patent number: 5473408Abstract: A system is described for recycling radiation reflected by an illuminated patterning mask in a via-hole drilling or exposure tool. The mask is illuminated by high-energy laser radiation, and the illuminated region is imaged onto a substrate by a projection, proximity, or contact method. The source radiation is suitably shaped by a lens assembly and focused into an optical intensity homogenizer with the desired numerical aperture. The homogenizer has the base function of converting the focused beam to self-luminous light required for drilling of via-holes or other processes accomplished by the tool, while maintaining the numerical aperture of the beam. The homogenizer also participates in the radiation-recycling function. An apertured reflector allows radiation from the source to enter the homogenizer. The radiation passing through and exiting the homogenizer is image by a lens to illuminate a portion of the mask.Type: GrantFiled: July 1, 1994Date of Patent: December 5, 1995Assignee: Anvik CorporationInventors: Jeffrey M. Hoffman, Kanti Jain
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Patent number: 5450246Abstract: A remotely controllable single/triple reflection glare-deflecting vehicle mirror provides remote control directional adjustment to an appropriate view, and also provides for easy and reversible toggling between single-reflection viewing and triple-reflection viewing. The mirror view adjustment is by remote control cables, selectively manually powered or powered by small linear motors. This view adjustment is maintained even during periods when glare conditions require that the wedge mirror be moved to anti-glare position, which is also done by remote control. The motor-powered version permits easy toggling from anti-glare triple-reflectivity to glare-susceptible single-reflectivity or back, by a tap switch. The manual-powered version permits easy toggling from anti-glare triple-reflectivity to glare-susceptible single-reflectivity or back, by a simple in-out motion of a glare control knob on the joystick used for view adjustment.Type: GrantFiled: November 4, 1992Date of Patent: September 12, 1995Assignee: ANVIK CorporationInventor: Kanti Jain