Patents Assigned to APET
  • Wafer cleaning apparatus and wafer cleaning method using the same
    Patent number: 10037881
    Abstract: The object of the present invention is to provide a wafer cleaning apparatus that reduces the amount of dissolved oxygen, without using hydrogen peroxide, to be able to reduce the deformation, etc. of a wafer and to reduce silicon consumption and a wafer cleaning method using the same.
    Type: Grant
    Filed: January 15, 2016
    Date of Patent: July 31, 2018
    Assignee: APET
    Inventors: Robert Henry Pagliaro, Sung Ho Hong, Jin Tae Kim, Deok Ho Kim
  • Wafer cleaning apparatus and wafer cleaning method using the same
    Patent number: 9240335
    Abstract: The object of the present invention is to provide a wafer cleaning apparatus that reduces the amount of dissolved oxygen, without using hydrogen peroxide, to be able to reduce the deformation, etc. of a wafer and to reduce silicon consumption and a wafer cleaning method using the same.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: January 19, 2016
    Assignee: APET
    Inventors: Robert Henry Pagliaro, Sung Ho Hong, Jin Tae Kim, Deok Ho Kim