Abstract: A hierarchical-GBL/LBL NAND array with a plurality of LG and MG groups in either orthogonal BL/CSL scheme or parallel BL/SL scheme including a plurality of block-decoders with a shared self-timed delay control circuit and a plurality of fully-shielding dynamic CACHE registers made of 2 local broken metal lines within the array and DRAM-like SA is provided. Each DCR capacitor is flexibly expandable by connecting multiple CLGs made by the local broken metal lines of the LGs to form a CMG of a larger MG. Based on the NAND array, multiple randomly selected WLs in multiple random blocks within multiple random LGs within one MG can be selected on basis of one WL per block per LG for performing an ABL pipeline and concurrent SLC program without verification, and on basis of one WL per block per MG for performing an ABL-like or HBL pipeline and concurrent SLC read.

Abstract: This invention discloses a HiNAND array scheme with multiple-level of bit lines (BLs) including metal3 global bit lines (GBLs), divided metal2 Segment bit lines (SBLs), and divided metal1 block bit lines (BBLs) laid out in parallel to each other respectively for a plurality of NAND Strings. All other source lines or power lines connected to bottoms of corresponding String capacitances of GBLs, SBLs, and BBLs are associated with metal0 line laid out perpendicular to those BLs. Under the HiNAND array scheme, conventional one-WL Read and Program-Verify operations are replaced by multiple-WL and All-BL Read and Program-Verify operations executed with charge capacitance of SBLs being reduced to 1/10- 1/20 of capacitance of GBLs to achieve DRAM-like faster operation, less operation stress, and lower power consumption. A preferred set of program biased voltages on the selected WL and remaining non-selected WLs associated with a Multiplier and a DRAM-like charge-sharing Latch Sensing Amplifier is proposed.

Abstract: A YUKAI NAND array comprising multiple strings of all TLC and mixed TLC+SLC memory cells associated with hierarchical global/local bit lines (GBL/LBL) and each string being associated with one LBL and having adjacent LBL as a dedicated local source line (LSL) with full BL-shielding without wasting extra silicon area and without a common source line to connect all strings. Each of the LBLs is interleavingly associated with either an Odd or Even string selected via one pair of dummy cells inserted in each string and is used as one on-chip PCACHE register with full BL-shielding to perform concurrent ABL, AnP and Alt-WL program under multi-passes program schemes with LBL program voltage compensations and half-BL Odd/Even program-verify and read operations with individual VSL-based Vt-compensation to mitigate high WL-WL and BL-BL coupling effects.

Abstract: This invention discloses a HiNAND array scheme with multiple-level of bit lines (BLs) including metal3 global bit lines (GBLs), divided metal2 Segment bit lines (SBLs), and divided metal1 block bit lines (BBLs) laid out in parallel to each other respectively for a plurality of NAND Strings. All other source lines or power lines connected to bottoms of corresponding String capacitances of GBLs, SBLs, and BBLs are associated with metal0 line laid out perpendicular to those BLs. Under the HiNAND array scheme, conventional one-WL Read and Program-Verify operations are replaced by multiple-WL and All-BL Read and Program-Verify operations executed with charge capacitance of SBLs being reduced to 1/10- 1/20 of capacitance of GBLs to achieve DRAM-like faster operation, less operation stress, and lower power consumption. A preferred set of program biased voltages on the selected WL and remaining non-selected WLs associated with a Multiplier and a DRAM-like charge-sharing Latch Sensing Amplifier is proposed.

Abstract: A HiNAND array with a hierarchical-BL scheme configured to divide a large global bit line (GBL) capacitance into J number of small local bit line (LBL) capacitances for reducing bit line precharge voltage and discharge time to achieve faster Read and Program-Verify speed, lower power consumption, lower latency, and lower word line disturbance for a reliable DRAM-like latch sensing. A reduced precharge voltage can be increased by M-fold (M?2) using a Multiplier between each bitline and each Latch sense amplifier (SA). Between each Multiplier and each Latch SA, there is a Connector with two optional designs for either fully passing a sense voltage to the Latch SA with a same-polarity and value or reversing the polarity the sensing voltage with additional amplification. The Latch SA is configured to transfer stored threshold states of a memory cell into a bit of a page buffer.

Abstract: A low-current FN channel scheme for erase, program, program-inhibit and read operations is disclosed for NAND NVM memories. This invention discloses a block array architecture and 3-step half-page program algorithm to achieve less error rate of NAND cell threshold voltage level. Thus, the error correction code capability requirement can be reduced, thus the program yield can be increased to reduce the overall NAND die cost at advanced nodes below 20 nm. As a result, this NAND array can still use the LV, compact PGM buffer for saving in the silicon area and power consumption. In addition, the simpler on-chip state-machine design can be achieved with the superior quality of less program errors.

Abstract: The present invention provides a two-cycle half-page read scheme by dividing whole NAND array bit lines (BLs) into an odd-BL group and an even-BL group. During the half-plane reading of NAND cells in the odd(even)-BL group, the half-plane even(odd)-BL group acts as the shielding BLs to protect over the odd(even)-BL string reading so that each half-page read operation is substantially reliable and free from BL coupling noise effect. Additionally, each half-page read operation is preferably divided into 3 periods: the first being a bias-condition setup period of the selected WL and remaining control signals; the second being a pre-charge period for all BLs; and the third being a half-page flash data sensing period.

Abstract: A semiconductor chip contains four different memory types, EEPROM, NAND Flash, NOR Flash and SRAM, and a plurality of major serial/parallel interfaces such as I2C, SPI, SDI and SQI in one memory chip. The memory chip features write-while-write and read-while-write operations as well as read-while-transfer and write-while-transfer operations. The memory chip provides for eight pins of which two are for power and up to four pins have no connection for specific interfaces and uses a novel unified nonvolatile memory design that allow the integration together of the aforementioned memory types integrated together into the same semiconductor memory chip.

Abstract: A low-current FN channel for Erase, Program, Program-Inhibit and Read operations is disclosed for any non-volatile memory using FN-tunneling scheme for program and erase operation, regardless NAND, NOR, and EEPROM and regardless PMOS or NMOS non-volatile cell type. As a result, all above NMV memories can use the disclosed LV, compact PGM buffer to replace the traditional HV PGM buffer for saving in the silicon area and power consumption. The page buffer is used to store new loaded data for new writing and to convert the stored data into the required BL HV voltage for either Erase or Program operations according to the stored data. In addition, the simpler on-chip State-machine design can be achieved with the superior quality of NVMs of this disclosure.

Abstract: Two on-chip capacitors including one HV capacitor VPPcap and one LV VCC capacitor VCCcap are built over a NVSRAM memory chip as a back-up second power supplies for each NVSRAM cell, regardless of 1-poly, 2-poly, PMOS or NMOS flash cell structures therein. The on-chip HV and LV capacitors are preferably made from one or more MIM or MIP layers for achieving required capacitance. A simplified VCC power system circuit without a need of a State machine designed for performing only one NVSRAM Program operation without Erase operations is proposed for initiating NVSRAM's Auto-Store operation without using any off-chip Vbat and Vcap. During the Auto-Store operation, all HV pumps and oscillators associated with the two on-chip capacitors are shut off once VCC voltage drop is detected by a VCC detector to be below 80% of regular VDD level.

Abstract: This invention discloses a 2T-string NOR-based CAM logic cell comprising two physical NAND cells connected in series with two horizontal WLs and one vertical BL and one vertical SL. Additionally, a sector of NOR-based CAM logic cell array is configured with N vertical cell strings each including M 2T-string NOR-based CAM logic cells connected in parallel sharing a local vertical SL and one dedicated vertical ML as an Operand word vertical page. Each 2T-string NOR-based CAM logic cell can be either a binary or ternary CAM cell associated with two or three physical states assigned to NAND cells' Vt levels for defining CAM logic states. Logic match of M-logic-bit inputs is found for at least one vertical page if the corresponding M 2T-string NOR-based CAM logic cells are in non-conduction state, providing M times faster Compare performance over the NAND-based CAM and 2 time faster than SRAM-based CAM.

Abstract: A nonvolatile memory device includes multiple independent nonvolatile memory arrays that concurrently for parallel reading and writing the nonvolatile memory arrays. A serial interface communicates commands, address, device status, and data between a master device and nonvolatile memory arrays for concurrently reading and writing of the nonvolatile memory arrays and sub-arrays. Data is transferred on the serial interface at the rising edge and the falling edge of the synchronizing clock. The serial interface transmits a command code and an address code from a master device and transfers a data code between the master device and the nonvolatile memory device, wherein the data code has a length that is determined by the command code and a location determined by the address code. Reading one nonvolatile memory array may be interrupted for reading another. One reading operation has two sub-addresses with one transferred prior to a command.

Abstract: The present invention discloses two preferred embodiments of a 12T NVSRAM cell with a flash-based Charger and a pseudo 10T NVSRAM cell with one shared Flash-based Charger. The Flash-based Charger can be made of a 2-poly floating-gate type or a 1-poly charge-trapping SONOS/MONOS flash type, regardless of PMOS type or NMOS type. In an alternative embodiment, the Store operation of above two preferred NVSRAM cell use a DRAM-like charge-sensing scheme with Flash cell configured into a voltage follower associated with Flash Charger and 2-step SRAM amplification technique to amplify the threshold level difference ?Vt stored in the paired Flash transistors. The ?Vt can be detected as low as 1V when the coupled charges through the Flash charger are sufficient by ramping a gate control of the Flash Charger as high as VPP or by increasing the channel length for the Flash Charger.

Abstract: The present invention discloses a 10T NVSRAM cell with a 6T SRAM cell with 4T Flash cell with one dedicated Flash-based Charger. In addition, a Pseudo-8T NVSRAM cell with a shared Flash-based Charger between two adjacent 8T NVSRAM cells at top and bottom in cell layout is also disclosed to further reduce cell size by 20%. As opposed to the prior art of 12T NVSRAM cell, the Store operation of the above two preferred embodiments use a DRAM-like charge-sensing scheme with Flash cell configured into a voltage follower ensured by the Flash-based Charger to obtain the final ?VQ-QB>0.2V at Q and QB nodes of each SRAM cell to cover all the mismatched of parasitic capacitance in flash cell devices and layout for a reliable amplification by ramping up SRAM's VDD line and ramping down SRAM's VSS line.

Abstract: Several preferred embodiments of 1S1F 16T NVSRAM, 1S1F 20T NVSRAM, 1S2F 22T NVSRAM, 1S2F 14T NVSRAM cells are proposed, regardless of 1-poly, 2-poly, PMOS or NOS flash cell structures. Two separate sourcelines for the paired flash Strings are also proposed for easy adding ability for the NVSRAM circuit to detect the marginally erased Vt0 and marginally programmed Vt1 of the paired flash cell. By increasing an resistance added to common SRAM power line, the pull-down current through flash Strings to grounding source line can be made much larger than the pull-up current to improve SFwrite program operation. Simple method by increasing flash cell channel length to effectively enhance coupling area is applied to secure SRAM-to-Flash store operation under self-boost-program-inhibit scheme. 1S2F architecture also provide flexibility for alternate erasing and programming during both a recall and store operation.

Abstract: A nonvolatile memory device has a combination of FLOTOX EEPROM nonvolatile memory arrays. Each FLOTOX-based nonvolatile memory array is formed of FLOTOX-based nonvolatile memory cells that include at least one floating gate tunneling oxide transistor such that a coupling ratio of the control gate to the floating gate of the floating gate tunneling oxide transistor is from approximately 60% to approximately 70% and a coupling ratio of the floating gate to the drain region of the floating gate tunneling oxide transistor is maintained as a constant of is from approximately 10% to approximately 20% and such that a channel length of the channel region is decreased such that during the programming procedure a negative programming voltage level is applied to the control gate and a moderate positive programming voltage level is applied to the drain region to prevent the moderate positive programming voltage level from exceeding a drain-to-source breakdown voltage.

Abstract: A novel NVM-based 2T or 2nT NAND-cell for a NAND-array for PLD, PAL and matching functions is disclosed. The preferable NVM cell can be ROM or Flash. The 2T flash cell preferably uses FN for both program and erase operation, while 2T ROM cell preferably to use phosphorus for ROM code implant to get negative Vt0.

Abstract: This invention discloses a 2T-string NOR-based CAM logic cell comprising two physical NAND cells connected in series with two horizontal WLs and one vertical BL and one vertical SL. Additionally, a sector of NOR-based CAM logic cell array is configured with N vertical cell strings each including M 2T-string NOR-based CAM logic cells connected in parallel sharing a local vertical SL and one dedicated vertical ML as an Operand word vertical page. Each 2T-string NOR-based CAM logic cell can be either a binary or ternary CAM cell associated with two or three physical states assigned to NAND cells' Vt levels for defining CAM logic states. Logic match of M-logic-bit inputs is found for at least one vertical page if the corresponding M 2T-string NOR-based CAM logic cells are in non-conduction state, providing M times faster Compare performance over the NAND-based CAM and 2 time faster than SRAM-based CAM.

Abstract: This invention discloses circuit and methods of a NAND-based 2T-string NOR flash cell structure as a building block for a fast random-read NOR flash memory. The key concept of this new set of bias conditions in cell array improves over the critical concern of punch-through issue when cell is migrating to the more advanced technology node of next generation. The invention adopts a novel preferable symmetrical 2T-string NOR flash cell. Each NAND or NAND like cell of this 2T-string NOR cell is to store 2 bits and is preferable to be made of N-channel device. The cell is preferable to use Fowler-Nordheim Tunneling scheme for both erase and program operations. The invention is to provide a novel 2T-string NOR flash cell structure made of N-channel device offering most flexible erase sizes in unit of byte, page, sector, block and chip with the least program and erase disturbances.

Abstract: A nonvolatile memory device has a combination of FLOTOX EEPROM nonvolatile memory arrays. Each FLOTOX-based nonvolatile memory array is formed of FLOTOX-based nonvolatile memory cells that include at least one floating gate tunneling oxide transistor such that a coupling ratio of the control gate to the floating gate of the floating gate tunneling oxide transistor is from approximately 60% to approximately 70% and a coupling ratio of the floating gate to the drain region of the floating gate tunneling oxide transistor is maintained as a constant of is from approximately 10% to approximately 20% and such that a channel length of the channel region is decreased such that during the programming procedure a negative programming voltage level is applied to the control gate and a moderate positive programming voltage level is applied to the drain region to prevent the moderate positive programming voltage level from exceeding a drain-to-source breakdown voltage.