Abstract: An electroless silver plating solution comprises a silver(I) complex, a thiosulfate salt, and a sulfite salt. This electroless silver plating solution uses a novel reducing agent combination of thiosulfate and sulfite. It shows a plating rate and a plating solution stability far superior to those of conventional silver plating solutions containing formaldehyde, reducing sugars, borohydride, hydrazine, and other reducing agents.
Type:
Grant
Filed:
February 22, 1993
Date of Patent:
June 21, 1994
Assignee:
Applied Electroless Concepts
Inventors:
Nenad V. Mandich, Gerald A. Krulik, Rajwant Singh