Patents Assigned to Applied Materrials, Inc.
  • Gate all-around device
    Patent number: 11024746
    Abstract: Gate all-around devices are disclosed in which an angled channel comprising a semiconducting nanostructure is located between a source and a drain. The angled channel has an axis that is oriented at an angle to the top surface of the substrate at an angle in a range of about 1° to less than about 90°. The gate all-around device is intended to meet design and performance criteria for the 7 nm technology generation.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: June 1, 2021
    Assignee: Applied Materrials, Inc.
    Inventors: Russell Chin Yee Teo, Benjamin Colombeau