Abstract: A system for cleaning an object and a method for cleaning an object by irradiating a multiphase fluid containing a gas and liquid droplets, wherein a desired impact force is obtained by controlling the degree of liquid-drop-impact cavitation, which is generated when the liquid droplets in the multiphase fluid hit the object.

Abstract: This invention provides a resist removing apparatus for removing a resist comprising a deteriorated layer and an undeteriorated layer from a substrate. The apparatus carries out the step of bringing radicals, reduced by subjecting any one of or a mixture of two or more of nitrogen, oxygen, hydrogen, and steam to plasma treatment under a low pressure, into contact with the substrate to remove the resist, and the step of bringing ozone water into contact with the substrate to remove the resist. In the step of removing the resist by radicals, a large part of the undeteriorated layer is allowed to remain by regulating the radical contact time depending upon conditions for the formation of the deteriorated layer on the resist surface. Alternatively, a large part of the undeteriorated layer may be allowed to remain by conducting process control according to the results of analysis of a reactant gas discharged during the removal of the resist.

Abstract: Disclosed is a system for treating an object, comprising a section for positioning an object on which the object to be treated is positioned under a predetermined atmosphere; a nozzle section for spraying the object with supplied vapor and water in mixture; means for moving the section for positioning an object and/or the nozzle section for allowing the nozzle section to spray the object on the section for positioning an object; means for controlling positional relationship between the section for positioning an object and the nozzle section to control relative rate (scan rate); and means for controlling, during the spraying, each of parameters of pressure of the vapor supplied to the nozzle section, flowrate of the water supplied to the nozzle section, area of an outlet of the nozzle section, spray time, scan rate and gap between the outlet of the nozzle section and the object.