Patents Assigned to Arch Speciality Chemicals, Inc.
  • Acetal protected polymers and photoresists compositions thereof
    Patent number: 6830870
    Abstract: A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III: wherein R1, R4, R5 and R6 are each independently H, lower alkyl, CH2CO2R10, cyano, CH2CN, or halogen, wherein R10 is any alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl or siloxy or linear or cyclic polysiloxane group; R2 is CHR11R12 where R11 and R12 are each independently H, lower alkyl, cycloalkyl or aryl; A is a substituted or unsubstituted alkylene, cycloalkylene, alkylenecycloalkylene, or alkylenearylene; and R3 is linear, branched or cyclic fluoroalkyl group or SiR13R14R15 where R13, R14, and R15 are each independently alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl, siloxy, linear or cyclic polysiloxane or silsesquioxane alkyl group; B is an aryl, C(═O)—O—(CH2)x where x=0-4, lower alkyl, cycloalkyl, alkene cycloalkyl, silyl, siloxyl, or linear or cycl
    Type: Grant
    Filed: May 28, 2003
    Date of Patent: December 14, 2004
    Assignee: Arch Speciality Chemicals, Inc.
    Inventors: Sanjay Malik, Stephanie J. Dilocker, Binod B. De
  • Photoresist compositions
    Publication number: 20040072095
    Abstract: Radiation sensitive compositions for use in producing a patterned image on a substrate comprise:
    Type: Application
    Filed: June 19, 2003
    Publication date: April 15, 2004
    Applicant: Arch Speciality Chemical, Inc.
    Inventors: David Brzozowy, Kocab J. Thomas, John P. Hatfield, Lawrence Ferreira, Andrew Blakeney
  • Acetal protected polymers and photoresists compositions thereof
    Publication number: 20040034160
    Abstract: A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III: 1
    Type: Application
    Filed: May 28, 2003
    Publication date: February 19, 2004
    Applicant: ARCH SPECIALITY CHEMICALS, INC.
    Inventors: Sanjay Malik, Stephanie J. Dilocker, Binod B. De
  • Remote monitoring system for chemical liquid delivery
    Publication number: 20040015331
    Abstract: A system and method for remote monitoring one or more liquid chemical delivery systems and/or tools associated with the fabrication and/or manufacturing of electronic/semiconductor components. Such a system and method allows the operator to quickly and accurately verify the status of each delivery system and tool with respect to liquid condition, alarms, problem situations, and other indications from one convenient location.
    Type: Application
    Filed: April 10, 2003
    Publication date: January 22, 2004
    Applicant: Arch Speciality Chemicals, Inc.
    Inventors: Chris Blatt, Mustafa Nayfah, Dan Wolfe, Marc Van Cleemput, Daniel Joseph Teff
  • Silicon-containing acetal protected polymers and photoresists compositions thereof
    Publication number: 20030065101
    Abstract: A photoresist composition comprising at least one acetal polymer having a silicon substituent; provided that the silicon substituent is not directly attached to the acetal functionality, thereby providing high resolution, improved DOF, and improved dimensional stability under metrology conditions.
    Type: Application
    Filed: April 4, 2002
    Publication date: April 3, 2003
    Applicant: ARCH SPECIALITY CHEMICALS, INC.
    Inventors: Andrew J. Blakeney, Sanjay Malik, Stephanie Dilocker, John Ferri, Jeffery Eisele