Patents Assigned to Arges Gmbh
  • Patent number: 10634523
    Abstract: The present invention is directed to an optical system for measuring the rotation angle of rotatable object having a rotation shaft (2), which system comprises a reflective diffraction element (6) mounted on said shaft and a module that includes a radiation source (8) emitting a monochromatic beam (bo) towards this element and a radiation-sensitive detection structure (14, 16), the diffraction element is configured to project diffraction order images (18) of its pattern onto associated sections (50(1)-54(2)) of an annular grating structure forming part of the detection structure and the surface size of the diffraction element is smaller than 20% of the surface size of the annular grating structure.
    Type: Grant
    Filed: May 3, 2017
    Date of Patent: April 28, 2020
    Assignee: Arges GmbH
    Inventors: Markus Guggenmos, Martin Hartmann, Bernhard Kiesbauer, Christiaan H. F. Velzel, Sven Pekelder, Rinze Frederik van der Kluit
  • Publication number: 20190145799
    Abstract: The present invention is directed to an optical system for measuring the rotation angle of rotatable object having a rotation shaft (2), which system comprises a reflective diffraction element (6) mounted on said shaft and a module that includes a radiation source (8) emitting a monochromatic beam (bo) towards this element and a radiation-sensitive detection structure (14, 16), the diffraction element is configured to project diffraction order images (18) of its pattern onto associated sections (50(1)-54(2)) of an annular grating structure forming part of the detection structure and the surface size of the diffraction element is smaller than 20% of the surface size of the annular grating structure.
    Type: Application
    Filed: May 3, 2017
    Publication date: May 16, 2019
    Applicant: Arges GmbH
    Inventors: Markus Guggenmos, Martin Hartmann, Bernhard Kiesbauer, Christiaan H.F. Velzel, Sven Pekelder, Rinze Frederik van der Kluit
  • Patent number: 6468356
    Abstract: A method for removing residues of molding material from metal parts of plastic packages of semiconductor devices includes applying first and second pulsed laser radiations to at least one surface region of a metal part covered with residues of molding material. The first pulsed laser radiation has a first wavelength that is absorbed by residues of molding material having a thickness greater than a prescribed thickness. The intensity and the duration of the first pulsed laser radiation causes the residues to be directly attacked. The second pulsed laser radiation has a second wavelength so that residues of molding material having a thickness less than the prescribed value are at least partially transparent and the metal parts are at least partially absorbent. The intensity and the duration of the second pulsed laser radiation causes the formation of plasma at the point of impact with the metal part.
    Type: Grant
    Filed: March 27, 2000
    Date of Patent: October 22, 2002
    Assignees: STMicroelectronics S.r.L., Arges Gmbh
    Inventors: Paolo Crema, Roberto Tiziani, Markus Guggenmos