Patents Assigned to Art Technology, Inc.
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Patent number: 10226959Abstract: A substrate processing device, which processes by immersing the substrate in the processing liquid comprising a mixture of a chemical and a diluting liquid, is provided with: a processing tank (1) that retains the processing liquid; heating means (2, 3) that heat the processing liquid; a temperature detection means (4) that detects the temperature of the processing liquid; a temperature control means (5) that operates the aforementioned heating means (2, 3) in a manner so that the detected temperature approaches a set temperature; a replenishing means (6) that replenishes the diluting liquid in the processing liquid; a concentration detection means (7) that detects the concentration of the processing liquid by measuring the light absorption characteristics of the processing liquid; and a concentration control means (8) that operates the aforementioned replenishing means (6) in a manner so that the detected concentration approaches a set concentration.Type: GrantFiled: July 21, 2011Date of Patent: March 12, 2019Assignees: Kurashiki Boseki Kabushiki Kaisha, Chemical Art Technology, Inc.Inventors: Hiromi Kiyose, Satoru Hiraki, Hiroshi Watanabe
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Publication number: 20130240143Abstract: A substrate processing device, which processes by immersing the substrate in the processing liquid comprising a mixture of a chemical and a diluting liquid, is provided with: a processing tank (1) that retains the processing liquid; heating means (2, 3) that heat the processing liquid; a temperature detection means (4) that detects the temperature of the processing liquid; a temperature control means (5) that operates the aforementioned heating means (2, 3) in a manner so that the detected temperature approaches a set temperature; a replenishing means (6) that replenishes the diluting liquid in the processing liquid; a concentration detection means (7) that detects the concentration of the processing liquid by measuring the light absorption characteristics of the processing liquid; and a concentration control means (8) that operates the aforementioned replenishing means (6) in a manner so that the detected concentration approaches a set concentration.Type: ApplicationFiled: July 21, 2011Publication date: September 19, 2013Applicants: CHEMICAL ART TECHNOLOGY, INC., KURASHIKI BOSEKI KABUSHIKI KAISHAInventors: Hiromi Kiyose, Satoru Hiraki, Hiroshi Watanabe
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Patent number: 8514170Abstract: A smaller sized flip dot display utilizes a magnetically actuated pixel that rotates between two orientations. The orientations display two different optical states. A simulated dot matrix design improves the aesthetics and consumer appeal, and also permits a flip dot display capable of producing a positive contrast display image with darker colored “ON” pixels contrasting with brighter background and “OFF” pixels by reducing the visibility of the spacing gap between each rotating pixel and the surrounding background. An interwoven configuration of magnetic actuators with a coil around each arm of a U-shaped core may result in lower power consumption, low production cost, and small size required for use in consumer and small mobile devices such as watches and mobile phones.Type: GrantFiled: September 27, 2007Date of Patent: August 20, 2013Assignee: Art Technology Inc.Inventors: Donald R. Brewer, David B. Cope, Andrew M. Wright, Christopher J. Corcoran
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Patent number: 8158075Abstract: This invention intends to enable silicon compound to be removed from waste etching solution at a high removal rate and waste etching solution to be recycled without disposing it. The etching solution reproducing apparatus includes: temperature adjusting means for adjusting the temperature of taken out waste etching solution; atomizing means for atomizing waste etching solution adjusted in temperature by the temperature adjusting means; precipitating means for collecting waste etching solution atomized by the atomizing means and precipitating silicon compound in the waste etching solution; and separating means for separating silicon compound precipitated from the waste etching solution by the precipitating means so as to obtain reproduced etching solution.Type: GrantFiled: November 7, 2007Date of Patent: April 17, 2012Assignee: Chemical Art Technology Inc.Inventor: Hiroshi Watanabe
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Patent number: 8156160Abstract: A method of generating a poet personality including reading poems, each of the poems containing text, generating analysis models, each of the analysis models representing one of poems and storing the analysis models in a personality data structure. The personality data structure further includes weights, each of the weights associated with each of the analysis models. The weights include integer values.Type: GrantFiled: November 22, 2010Date of Patent: April 10, 2012Assignee: Kurzweil Cyber Art Technologies, Inc.Inventors: Raymond Kurzweil, John A. Keklak
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Patent number: 8117084Abstract: A method and apparatus for establishing a phone call between a potential customer viewing information on the internet and a sales agent includes the steps of receiving a message indicating that the customer wishes to be contacted and including contact information for the customer and other information, converting at least some of the information in the message to speech, establishing a phone call to the sales agents, playing the speech to the sales agent, establishing a phone call to the customer using the contact information in the message, and bridging the first call to the second call. In some embodiments, a text message such as email or SMS is sent in addition to the phone call to the sales agent or when the phone call to the sales agent cannot be completed.Type: GrantFiled: February 6, 2007Date of Patent: February 14, 2012Assignee: Art Technology, Inc.Inventor: Joseph Siegrist
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Publication number: 20090049653Abstract: This invention intends to enable silicon compound to be removed from waste etching solution at a high removal rate and waste etching solution to be recycled without disposing it. The etching solution reproducing apparatus includes: temperature adjusting means for adjusting the temperature of taken out waste etching solution; atomizing means for atomizing waste etching solution adjusted in temperature by the temperature adjusting means; precipitating means for collecting waste etching solution atomized by the atomizing means and precipitating silicon compound in the waste etching solution; and separating means for separating silicon compound precipitated from the waste etching solution by the precipitating means so as to obtain reproduced etching solution.Type: ApplicationFiled: November 7, 2007Publication date: February 26, 2009Applicant: CHEMICAL ART TECHNOLOGY INC.Inventor: Hiroshi WATANABE
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Publication number: 20060231124Abstract: Provided is a processing method capable of reliably processing the inside of a depression such as a trench, a contact hole, a deep pattern, or a pore of a porous substrate. A chemical solution M is supplied into a processing bath 1 placing a substrate W, and the processing bath 1 is repetitively evacuated and pressurized several times at a pressure lower than the atmospheric pressure. Alcohol X is brought into contact with the surface of the substrate W and supplied into a depression W?1. The chemical solution M is supplied into the processing bath 1 containing the substrate W until the chemical solution M reaches a water level at which the substrate W is dipped, thereby allowing the chemical solution M to enter the depression W?1. The chemical solution M is discharged from the processing bath 1, and a portion of the chemical solution M entering the depression W?1 and mixed with the alcohol X is evaporated by evacuating the processing bath 1. This process is repeated several times.Type: ApplicationFiled: May 15, 2006Publication date: October 19, 2006Applicants: Chemical Art Technology Inc., Cannon Kabushiki KaishaInventors: Hiroshi Watanabe, Tamotsu Mezaki, Shigeru Kido, Kiyofumi Sakaguchi
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Publication number: 20040060574Abstract: Provided is a processing method capable of reliably processing the inside of a depression such as a trench, a contact hole, a deep pattern, or a pore of a porous substrate. A chemical solution M is supplied into a processing bath 1 placing a substrate W, and the processing bath 1 is repetitively evacuated and pressurized several times at a pressure lower than the atmospheric pressure. Alcohol X is brought into contact with the surface of the substrate W and supplied into a depression W-1. The chemical solution M is supplied into the processing bath 1 containing the substrate W until the chemical solution M reaches a water level at which the substrate W is dipped, thereby allowing the chemical solution M to enter the depression W-1. The chemical solution M is discharged from the processing bath 1, and a portion of the chemical solution M entering the depression W-1 and mixed with the alcohol X is evaporated by evacuating the processing bath 1. This process is repeated several times.Type: ApplicationFiled: July 16, 2003Publication date: April 1, 2004Applicants: CHEMICAL ART TECHNOLOGY INC., CANON KABUSHIKI KAISHAInventors: Hiroshi Watanabe, Tamotsu Mezaki, Shigeru Kido, Kiyofumi Sakaguchi
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Patent number: D442907Type: GrantFiled: March 1, 2000Date of Patent: May 29, 2001Assignee: Art Technologies, Inc.Inventor: Steven C. Santelman