Patents Assigned to Asahi Glass Ceramics Co., Ltd.
  • Target and process for its production, and method of forming a film having a high refractive index
    Patent number: 6743343
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Grant
    Filed: July 10, 2002
    Date of Patent: June 1, 2004
    Assignee: Asahi Glass Ceramics Co., Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi