Patents Assigned to ASAHI GLASS FINE TECHNO CO., LTD.
  • Publication number: 20090218215
    Abstract: A laminate for forming a substrate with wires in which a silver type material is used for a conductor layer and the layer is covered with a conductive protection layer for protection, the laminate for forming a substrate with wires exhibiting an extremely low contact resistance between the conductive protection layer and a cathode superposed thereon, is presented. A laminate for forming a substrate with wires, which comprises a substrate, a conductor layer comprising silver or a silver alloy, formed on the substrate, and a conductive protection layer comprising indium zinc oxide, formed on the conductor layer to cover the conductor layer, wherein the conductive protection layer is a conductive protection layer formed by sputtering in an atmosphere wherein the oxidizing gas content in the sputtering gas is not more than 1.5 vol %.
    Type: Application
    Filed: February 25, 2009
    Publication date: September 3, 2009
    Applicants: ASAHI GLASS COMPANY LIMITED, PIONEER CORPORATION, TOHOKU PIONEER CORPORATION, ASAHI GLASS FINE TECHNO CO., LTD.
    Inventors: Kenichi NAGAYAMA, Kunihiko Shirahata, Takayuki Kitajima, Masaki Komada, Yusuke Nakajima, Takehiko Hiruma, Hitoshi Saiki
  • Publication number: 20060172127
    Abstract: A laminate for forming a substrate with wires in which a silver type material is used for a conductor layer and the layer is covered with a conductive protection layer for protection, the laminate for forming a substrate with wires exhibiting an extremely low contact resistance between the conductive protection layer and a cathode superposed thereon, is presented. A laminate for forming a substrate with wires, which comprises a substrate, a conductor layer comprising silver or a silver alloy, formed on the substrate, and a conductive protection layer comprising indium zinc oxide, formed on the conductor layer to cover the conductor layer, wherein the conductive protection layer is a conductive protection layer formed by sputtering in an atmosphere wherein the oxidizing gas content in the sputtering gas is not more than 1.5 vol %.
    Type: Application
    Filed: March 30, 2006
    Publication date: August 3, 2006
    Applicants: ASAHI GLASS COMPANY LIMITED, PIONEER CORPORATION, TOHOKU PIONEER CORPORATION, ASAHI GLASS FINE TECHNO CO., LTD.
    Inventors: Kenichi Nagayama, Kunihiko Shirahata, Takayuki Kitajima, Masaki Komada, Yusuke Nakajima, Takehiko Hiruma, Hitoshi Saiki