Abstract: To provide a reflective mask blank for EUV lithography having a low reflective layer having a low reflectance in the wavelength region of EUV light and an inspection light for a mask pattern, particularly having low reflection properties in the entire wavelength region (190 to 260 nm) of an inspection light for a mask pattern, and having a high etching rate in chlorine type gas etching. A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer to reflect EUV light, an absorber layer to absorb EUV light and a low reflective layer to an inspection light (wavelength:190 nm to 260 nm) for a mask pattern, formed in this order over the substrate, wherein the low reflective layer contains silicon (Si) and nitrogen (N) in a total content of at least 95 at %, has a Si content of from 5 to 80 at %, and a N content of from 15 to 90 at %.

Abstract: The present invention is to provide a processing method for manufacturing a highly flat and highly smooth glass substrate with good productivity. A highly flat and highly smooth glass substrate is obtained with good productivity by processing of a glass substrate, which comprises a step of measuring the surface shape of the glass substrate prior to processing, a step of processing the surface of the substrate by changing a processing condition for each site (first processing step), and a step of finish-polishing the surface of the glass substrate that has been subjected to the first processing step (second processing step).

Abstract: A conduit structure for molten glass, a conduit system for molten glass, a vacuum degassing apparatus and a method for vacuum-degassing molten glass by use of the vacuum degassing apparatus, which are capable of effectively removing components eluted from a refractory brick forming a conduit for molten glass, foreign substances generated in the interface between molten glass and a platinum wall surface forming a conduit for molten glass, a bubble remaining in a surface layer of molten glass, a glass material denatured by volatilization, and the like, are provided.

Abstract: In a silicon manufacturing apparatus and its related manufacturing method, a zinc gas supply opening (18b, 180b, 181b, 182b, 183b, 184b, 185b, 280a) is placed above a silicon tetrachloride gas opening (16a, 160a). A part of a reactor (10, 100), heated by a heater (22), is set to a silicon depositing temperature range, during which silicon tetrachloride gas is supplied from the silicon tetrachloride gas opening to the reactor to which zinc gas is supplied from the zinc gas supply opening, whereby silicon tetrachloride is reduced with zinc in the reactor to form a silicon depositing region (S), in which silicon is deposited on a wall portion in the reactor corresponding to a region thereof that is set to the silicon depositing temperature range.

Abstract: The present invention provides novel polymers obtained by polymerizing a compound of formula (1) which has a highly fluorinated norbornane structure.

Abstract: A projection type display apparatus includes: a light source section including at least one light source for emitting coherent light; an image light generating section for modulating the light emitted from the light source section so as to generate image light; a projection section for projecting the image light; and a depolarization element for transmitting the incident light in a state that a polarization state of at least a part of the light is changed, the depolarization being provided on an optical path of the light emitted from the light source section, wherein a plurality of unit regions having a particular shape are aligned in the depolarization element.

Abstract: A reflective mask blank for EUV lithography having an absorbing layer which has a low reflectivity with respect to wavelength regions of EUV light and pattern inspection light, and which is easily controllable to obtain desired film composition and film thickness. The reflective mask blank for EUV lithography having a reflective layer for reflecting EUV light and an absorbing layer for absorbing EUV light which are formed in this order on a substrate, wherein the absorbing layer contains at least tantalum (Ta), boron (B), nitrogen (N) and hydrogen (H), and the absorbing layer has a B content that is 1 at % or greater but less than 5 at %, an H content that is between 0.1 and 5 at %, a Ta+N total content that is between 90 and 98.9%, and a Ta:N composition ratio (Ta:N) that is between 8:1 and 1:1.

Abstract: A projection type display device includes: a light emitting unit that includes at least one light source for emitting a coherent light. An image light generating unit modulates the light emitted by the light emitting unit to generate an image light. A projecting unit projects the image light. A phase modulating unit is arranged either between the light emitting unit and the image light generating unit or between the image light generating unit and the projecting unit and has an area where at least one of a retardation value and an azimuth direction of a slow axis is distributed respectively in different directions or values in a plane orthogonal to an optical axis.

Abstract: To provide a photocurable composition with which a fine pattern molded product on which a fine pattern of a mold is highly precisely transferred can efficiently be produced. A photocurable composition comprising 100 parts by mass of a photocurable monomer (A), from 5 to 60 parts by mass of a colloidal silica (B) (solid content) having an average particle size of at most 200 nm, and from 0.1 to 10 parts by mass of a photopolymerization initiator (C), wherein the photocurable monomer (A) comprises a multifunctional monomer (A1) having at least 3(meth)acryloyloxy groups in one molecule and a bifunctional monomer (A2) having two (meth)acryloyloxy groups in one molecule, at least one compound belonging to the multifunctional monomer (A1) or the bifunctional monomer (A2) has a hydroxy group, and the ratio of the total amount (mol) of hydroxy groups to the total amount (mol) of the multifunctional monomer (A1) and the bifunctional monomer (A2) is at least 10%.

Abstract: The present invention provides a frit containing substantially no lead, which is applicable to a member having ? of at most 50×10?7/° C. A frit comprising a low-melting point glass powder and a refractory filler powder, containing substantially no lead, having a thermal expansion coefficient of at most 50×10?7/° C., and being processable at 500° C. or lower, wherein the above low-melting point glass powder satisfies a softening pour point range of at least 30° C., and the above refractory filler powder satisfies the following relationship: 1<S×?<10 S: specific surface area (m2/g) ?: density (g/cm3).

Abstract: To provide a process for producing ceria-zirconia solid solution crystal fine particles having high crystallinity, being excellent in uniformity of composition and particle size, having a small particle size and a high specific surface area and being excellent in heat resistance, and such solid solution crystal fine particles. A process comprises a step of obtaining a melt containing, as represented by mol % based on oxides, from 5 to 50% of (ZrO2+CeO2), from 10 to 60% of RO (wherein R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba) and from 25 to 70% of B2O3, a step of quenching the melt to obtain an amorphous material, a step of heating the amorphous material at a temperature of from 550 to 1000° C.

Abstract: To provide a novel polymerizable fluorocompound having a highly fluorinated norbornane structure, and a polymer obtained from the compound. Further, their production processes and a novel intermediate useful for the processes. A novel compound (1) such as a compound (11) or a compound (12), and its polymer. A compound (2) such as a compound (21) or (22), and a compound (3) such as a compound (31) or (32M), which are useful as an intermediate for the production of the compound (1), and its production process. However, each of ZA to ZE represents such as —CH(—OC(O)C(CH3)?CH2)— or —CF2, Each of WA and WB represents such as F, each of YA to YE represents such as —CH(—OH)— or —CF(CH2OH), and each of XA to XE represents such as —C(O)— or —CF2—.

Abstract: An organo polysiloxane to improve the abrasion and weather resistance of a hard coating layer obtained from a silicone-type hard coating composition. The hard coating composition contains a first organo polysiloxane having silicone-containing bond units selected from the group consisting of R—Si(—OX)2(—O*—), R—Si(—OX)(—O*—)2 and R—Si(—O*—)3) and a second organo polysiloxane having the same, where the second organo polysiloxane has a weight average molecular weight of 1/10 to 1/1.5 times that of the first organo polysiloxane. Further, a resin substrate having a hard coating layer made of a cured product of the hard coating composition that has improved abrasion and weather resistance. For resin substrates used in a bent state, the hard coating layer also improves the cracking resistance associated with mechanical stress.

Abstract: To provide an electret having high stability with time and thermal stability of retained electric charge and having excellent charge retention performance, and an electrostatic induction conversion device comprising such an electret. This has been done by providing an electret obtained from a composition comprising a compound (A) having a molecular weight of from 50 to 2000 and having at least two polar functional groups, and a polymer (B) having a number average molecular weight of more than 2000 and having reactive functional groups reactive with the above polar functional groups and an electrostatic induction conversion device comprising such an electret.

Abstract: A fluororesin film, of which discoloration, a change in the visible light transmittance and a decrease in the mechanical strength can be suppressed for a long period of time even though it contains titanium oxide, the fluorescent film having a pigment dispersed in a fluororesin, which pigment are composite particles each comprising a particle containing titanium oxide, a first covering layer containing cerium oxide and a second covering layer containing silicon oxide in this order from the inside, wherein the amount of cerium oxide is from 5 to 30 parts by mass based on 100 parts by mass of titanium oxide, the amount of silicon oxide is from 5 to 60 parts by mass based on 100 parts by mass of titanium oxide, and the average particle size of the composite particles is from 0.15 to 3 ?M; and a process for its production.

Abstract: A polymer electrolyte membrane made of a polymer has a low electrical resistance, high heat resistance and is strong against repeats of swelling and shrinkage. Thus, a membrane/electrode assembly for polymer electrolyte fuel cells having high power generation performance and excellent in durability can be provided. For a polymer electrolyte membrane 15 or for a catalyst layer 11 constituting electrodes 13 and 14, a polymer comprising units (U1) and units (U2) is used: Q1, Q2: a perfluoroalkylene group which may have —O— or the like; Rf1, Rf2: a perfluoroalkyl group which may have —O—; X: an oxygen atom or the like; a: 0 or the like; Y, Z: a fluorine atom, or a monovalent perfluoroorganic group such as —CF3; S: 0 to 1; and t: 0 to 3.

Abstract: The present invention provides a method for smoothing an optical surface of an optical component for EUVL. Specifically, the present invention provides a method for smoothing an optical surface of an optical component for EUVL made of a silica glass material containing TiO2 and comprising SiO2 as a main component with a laser having an oscillation wavelength, to which the optical component for EUVL has an absorption coefficient of 0.01 ?m?1 or more, at a fluence of 0.3 to 1.5 J/cm2 in an atmosphere having a water vapor partial pressure of 3.6 mmHg or less.

Abstract: A fiber reinforced plastic pipe is provided to prevent it from being damaged and make full use of its practical performance when the fiber reinforced plastic pipe, reduced in thickness and increased in diameter by pultrusion process, is reduced in the circumferential direction and inserted into a metal pipe. The fiber reinforced plastic pipe, reduced in thickness and increased in diameter by pultrusion process, includes a fiber bundle spun and aligned in the longitudinal direction, and circumferential reinforced fiber sheet provided at least on one of the outer and inner surface layers. The circumferential reinforced fiber sheet is inserted into the metal pipe to form a power transmission shaft such as an intermediate shaft for use with a propeller shaft or a drive shaft.

Abstract: A gas/liquid mixing equipment of the present invention comprises a stirring vessel 1, a stirring shaft 10 inserted horizontally in the stirring vessel 1 and a helical ribbon impeller 20 attached to the stirring shaft 10, whereby a high gas absorption performance can be secured even with low shearing. Further, a polymer can be produced with high productivity. A gas/liquid mixing method of the present invention is a method which comprises employing the above-mentioned gas/liquid mixing equipment, and a method for producing a polymer of the present invention is a method which comprises polymerizing feed monomers containing gaseous monomers in aqueous solvents, wherein the gaseous monomers and the aqueous solvents are mixed by such a gas/liquid mixing method. A polymer of the present invention is produced by the above-mentioned method for producing a polymer.

Abstract: To provide a glass for an information recording media substrate, which is excellent in weather resistance. A glass for an information recording media substrate, which comprises, as represented by mol % based on oxide, from 61 to 66% of SiO2, from 11.5 to 17% of Al2O3, from 8 to 16% of Li2O, from 2 to 8% of Na2O, from 2.5 to 8% of K2O, from 0 to 6% of MgO, from 0 to 4% of TiO2 and from 0 to 3% of ZrO2, provided that Al2O3+MgO+TiO2 is at least 12%, and Li2O+Na2O+K2O is from 16 to 23%, wherein in a case of where B2O3 is contained, its content is less than 1%. The above glass for an information recording media substrate, wherein when the glass is left under steam atmosphere at 120° C. at 0.2 MPa for 20 hours, and the amount of Li, the amount of Na and the amount of K, which precipitate on a surface of the glass are represented as CLi, CNa and CK respectively, CNa is at most 0.7 nmol/cm2, and CLi+CNa+CK is at most 3.5 nmol/cm2.