Patents Assigned to ASKAGI CORPORATION
  • Plasma treatment device and structure of reaction vessel for plasma treatment
    Patent number: 11225718
    Abstract: The present invention improves the in-plane uniformity of film formation via a plasma treatment.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: January 18, 2022
    Assignees: CORE TECHNOLOGY, INC., ASKAGI CORPORATION
    Inventors: Toshiaki Yoshimura, Hiroyuki Minowa, Lung Kei Amos Shek
  • Plasma treatment device and structure of reaction vessel for plasma treatment
    Patent number: 11227748
    Abstract: The present invention improves the in-plane uniformity of films formed via a plasma treatment.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: January 18, 2022
    Assignees: CORE TECHNOLOGY, INC., ASKAGI CORPORATION
    Inventors: Toshiaki Yoshimura, Hiroyuki Minowa, Lung Kei Amos Shek
  • Substrate tray for use in thin-film formation device
    Patent number: 11174554
    Abstract: Provided is a substrate tray which is to be used in a thin-film formation device and makes it easy to improve film quality and film thickness uniformity on a substrate by improving substrate heating efficiency and substrate heating uniformity.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: November 16, 2021
    Assignees: CORE TECHNOLOGY, INC., ASKAGI CORPORATION
    Inventors: Toshiaki Yoshimura, Hiroyuki Minowa, Lung Kei Amos Shek