Abstract: A positioning device comprising a first part and a second part which is displaceable relative to the first part by means of a system of Lorentz-force motors, whereby, relative to the first part, the second part is supported in a Z-direction by means of at least one gas cylinder, said gas cylinder comprising a housing having a pressure chamber, which housing is coupled to the first part; and a piston which is coupled to the second part and which can be displaced in the pressure chamber in the Z-direction, said piston being journaled relative to said housing substantially at right angles to the Z-direction.

Abstract: Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a circular phase structure (22) on a photoresist (PR), developing the resist and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure (25) and each type of aberration, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other. Each type of aberration is represented by a specific Fourier harmonic (Z−), which is composed of Zernike coefficients (Z−), each representing a specific lower or higher order sub-aberration.

Abstract: A lithographic projection apparatus with an off-axis alignment unit for aligning a substrate alignment mark (P1) with respect to a reference (RGP) is described. This unit comprises a structure (WEP) of deflection elements (80-86) which give the sub-beams having different diffraction orders coming from the diffractive substrate mark (P1) different directions so that these sub-beams are incident on separate reference gratings (90-96) and can be detected by separate detectors (DET). This unit also provides the possibility of aligning asymmetrical alignment marks with great accuracy.

Abstract: A gas (air) beating in a ceramic body is made using a separate restriction member to define the air restriction feature. The separate member may be a metal bushing in which an insert is fitted, the insert having an opening defining the actual restriction feature. Alternatively the separate member may be a ceramic plate with restriction features machined by laser or abrasion before or after attachment to the main body.

Abstract: A positioning device has first and second object holders that are guided over a guiding surface extending parallel to an X-direction and parallel to a Y-direction perpendicular to the X-direction and which are displaceable over the guiding surface from a first position into a second position by means of a displacement system. The displacement system includes a first displacement unit and a second displacement unit to which the object holders can be alternately coupled. The first displacement unit is suitable for carrying out a first series of positioning steps of the first object holder in the first position and for displacing the first object holder from the first position into an intermediate position between the first and second positions.

Abstract: Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The apparatus (1) is adapted in such a way that both the stepper mode and the scanner mode are selectable modi, and comprises means by which the illumination unit (11), when being operative, has a slit-shaped static illumination field with a width s which is variable between smin and smax while substantially maintaining energy within the static illumination field.

Abstract: A lithographic projection apparatus comprising: a radiation system (7) for supplying a projection beam (25) of radiation; a mask table (5) provided with a mask holder (27) for holding a mask (29); a substrate table (1) provided with a substrate holder (17) for holding a substrate (19); a projection system (3) for imaging an irradiated portion of the mask (29) onto a target portion (35) of the substrate (19), the substrate holder (17) comprising a plate (2) having a face (4) which is provided with a matrix arrangement of protrusions (6), each protrusion (6) having an extremity (6′) remote from the face (4) and being thus embodied that the said extremities (6′) all lie within a single substantially flat plane (6″) at a height H above the face (4), the substrate holder (17) further comprising a wall (8) which protrudes from the face (4), substantially encloses the matrix arrangement, and has a substantially uniform height h above the face (4), whereby h<H, the face (4) inside the wall (

Abstract: In a lithographic projection apparatus, a time-saving height measurement method is used. While in a projection station (105,108,111) the pattern of a mask (129) is projected on the fields of a first substrate (120), the height of the fields of a second substrate (121) is measured in a measuring station (133). In the measuring station, the height of the substrate fields and the height of the substrate holder (113) are measured by a first height sensor (150) and a second height sensor (160), respectively, and the value of the height of the substrate holder associated with the ideal height of the substrate field is determined for each substrate field. In the projection station, only the height of the substrate holder (111) is controlled by a third height sensor (180). The second and third height sensors are preferably part of a composite XY interferometer system extended with a Z measuring axis.

Abstract: An alignment device, for use in a lithographic apparatus, for aligning a first object, provided with a first alignment mark relative to a second object, provided with a second alignment mark, employs as a radiation source a laser which emits an alignment beam having a wavelength which is of the order of 1000 nm and to the order of 1100 nm.

Abstract: Support device (53) provided with a first part (69) and a second part (71) which is supported relative to the first part by means of a gas spring (73) having a pressure chamber (75). A gas supply (117), which compensates for gas leakage from the pressure chamber (75) during operation, is connected to an intermediate space (119) which is in communication with the pressure chamber (75) via a pneumatic restriction (121). The gas pressure present in the intermediate space (119) is held as constant as possible during operation by means of a control loop (123), to prevent transmission of pressure fluctuations which are present in the gas supply (117) to the pressure chamber (75) as much as possible. Such pressure fluctuations are undesirable in the pressure chamber because they cause mechanical vibrations in the second part of the support device and the device to be supported.

Abstract: In an interferometer system, variations of the refractive index in the medium traversed by the measuring beam (123) can be detected by using two measuring beams (123, 125) having wavelengths which differ by a factor of three. For this choice of the wavelength ratio, the interference filters of the polarization elements, such as the beam splitter (127), the .lambda./4 plates (130, 131) and the antireflection coatings can be manufactured relatively easily, and the detection accuracy is increased.

Abstract: A lithographic projection apparatus for step-and-scan imaging of a mask pattern (c) on a substrate (W) is described. The synchronous movement of the mast (MA) and the substrate (W) during scanning is controlled by means of contactless measuring systems, inter alia, interferometer systems (ISR, ISW), while the measuring faces (R.sub.1,r, R.sub.1,w) associated with these systems are formed by faces of the holders (WH, MH) for the substrate (W) and the mask (MA), so that very accurate measurements are possible.

Abstract: Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The apparatus (1) is adapted in such a way that both the stepper mode and the scanner mode are selectable modi, and comprises means by which the illumination unit (11), when being operative, has a slit-shaped static illumination field with a width s which is variable between s.sub.min and s.sub.max while substantially maintaining energy within the static illumination field.

Abstract: A positioning device is disclosed. The positioning device has a first part and a second part, the second part further has an object table. The second part may be displaced relative to the first part parallel to the XY-plane and may be rotated about the Z-axis by means of three motors. The motors are Lorentz type motors having a permanent magnet system and an electrical coil system cooperating therewith. The electrical coil systems each have windings which are substantially directed parallel to a main axis of the electrical coil system and perpendicular to the Z-axis. According to the invention, the main axis of each of the three motors encloses an angle of substantially 120.degree. with the main axis of each of the two other motors.

Abstract: Illumination unit (2) for an optical system, including an illumination system (1) which comprises, in this order, a radiation source (3) and a first optical integrator (11). The illumination unit (2) further comprises a detection system (45) including a radiation-sensitive detector (47). The illumination system (1) comprises a second optical integrator (13). The two integrators (11, 13) enclose a prism system (15) comprising at least one prism (17). The prism system (15) has a coupling-out surface via which light can be coupled out of the illumination system (1), and an exit surface via which light can be coupled out of the prism system (15), without the intensity in the main light path being essentially influenced. The detection system (45) is arranged proximate to the exit surface of the prism system (15) and comprises light-integrating means.

Abstract: A composite interferometer system has a plurality of X and/or Y measuring axes which co-operate with an X and/or Y measuring mirror arranged on an object. The interferometer system also has at least one Z measuring axis, which extends partly in an XY plane and co-operates with Z measuring mirrors arranged on the object and Z reflectors. Thus, a larger number of more accurate and reliable measurements can be performed with the interferometer system.

Abstract: An imaging apparatus and an illumination unit for use in such an apparatus are described, which unit comprises an illumination housing (LH) accommodating a radiation source (LA) and at least a reflector (RL). To prevent a decrease of the radiation power supplied by the illumination housing, this housing is provided with means (LA, SH, L.sub.29) which prevent a diffuse deposit of silicon-containing particles present in the ambient air from being formed on optical components within the illumination housing.

Abstract: A projection apparatus is described having a reference plate with a set of grating marks in X and Y directions for aligning with an exposure mask having similar marks, and having four detectors for each mark, and having a lens system for projecting only the relevant mark on the relevant detector. A method of projecting is also described in which the detection signals are simultaneously processed with other signals to result in a control signal to adjust image quality.

Abstract: A positioning device for manipulation of objects, provided with an object holder (5) which is rotatable about an axis of rotation (.theta.) by means of a .theta.-manipulator and is displaceable by translation along a Z-axis coinciding with the axis of rotation (.theta.) by means of a Z-manipulator. The two manipulators are coupled to each other by means of a separator (17, 153) in such a manner that the .theta.-movement and the Z-movement are independent of each other. The positioning device is particularly suitable for manipulation of objects in the submicron range, such as takes place, for example, in optical lithographic devices according to the invention.