Patents Assigned to ASMD NETHERLANDS B.V.
  • Publication number: 20110204484
    Abstract: Measurement targets for use on substrates, and overlay targets are presented. The targets include an array of first regions alternating with second regions, wherein the first regions include structures oriented in a first direction and the second regions include structures oriented in a direction different from the first direction. The effective refractive index of the two sets of regions are thereby different when experienced by a polarized beam, which will act as a TM-polarized beam when reflected from the first set of regions, but as a TE-polarized beam when reflected from the second set of regions.
    Type: Application
    Filed: May 27, 2009
    Publication date: August 25, 2011
    Applicant: ASMD NETHERLANDS B.V.
    Inventors: Maurits Van Der Schaar, Marcus Adrianus Van De Kerkhof, Sami Musa