Patents Assigned to ASML Metherlands B.V.
  • Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
    Patent number: 8125610
    Abstract: A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.
    Type: Grant
    Filed: December 2, 2005
    Date of Patent: February 28, 2012
    Assignee: ASML Metherlands B.V.
    Inventor: Jan Cornelis Van Der Hoeven