Patents Assigned to ASML Neitherlands B.V.
  • Lithography Method and Apparatus
    Publication number: 20130128246
    Abstract: In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load.
    Type: Application
    Filed: July 18, 2011
    Publication date: May 23, 2013
    Applicant: ASML Neitherlands B.V.
    Inventors: Adrìanus Hendrik Koevoets, Michael Jozef Mathijs Renkens, Sander Frederik Wuister
  • Lithographic Apparatus, Aberration Detector and Device Manufacturing Method
    Publication number: 20120026477
    Abstract: An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in a direction parallel to the optical axis of the projection system. A controller obtains a representation of the aberration of the projection system from the captured images.
    Type: Application
    Filed: June 27, 2011
    Publication date: February 2, 2012
    Applicant: ASML Neitherlands B.V.
    Inventor: Wilhelmus Jacobus Maria ROOIJAKKERS