Abstract: Disclosed is an electrostatic clamp apparatus (500) constructed to support a patterning device (505) of a lithographic apparatus, comprising a support structure against which said patterning device is supported, clamping electrodes (525) for providing a clamping force between the support structure and patterning device, and an array of capacitive sensors (660) operable to measure the shape of said patterning device.
Type:
Application
Filed:
January 18, 2012
Publication date:
January 2, 2014
Applicant:
ASML Netherelands B.V.
Inventors:
Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Theodorus Petrus Maria Cadee, Johannes Antonius Gerardus Akkermans, Luigi Scaccabarozzi, Christiaan Louis Valentin