Patents Assigned to ASML Netheriands B. V.
  • LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
    Publication number: 20240036485
    Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
    Type: Application
    Filed: December 2, 2021
    Publication date: February 1, 2024
    Applicants: ASML Netheriands B. V., ASML Holding N.V.
    Inventors: Arjan Johannes Anton BEUKMAN, Sebastianus Adrianus GOORDEN, Stephen ROUX, Sergel SOKOLOV, Filippo ALPEGGIANI