Patents Assigned to ASML Netherland B.V.
  • Metrology method and device for determining a complex-valued field
    Patent number: 12117734
    Abstract: Disclosed is a method of measuring a structure, and associated metrology device and computer program. The method comprises obtaining an amplitude profile of scattered radiation relating to a measurement of a first structure on a first substrate and obtaining a reference phase profile relating to a reference measurement of at least one reference structure on a reference substrate. The at least one reference structure is not the same structure as said first structure but is nominally identical in terms of at least a plurality of key parameters. The method further comprises determining a complex-valued field to describe the first structure from the amplitude profile and reference phase profile.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: October 15, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Nitesh Pandey, Alexander Prasetya Konijnenberg
  • Lithographic apparatus and device manufacturing method
    Patent number: 12117721
    Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
    Type: Grant
    Filed: December 22, 2022
    Date of Patent: October 15, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
  • Thermo-mechanical actuator
    Patent number: 12117739
    Abstract: Disclosed is a thermo-mechanical actuator (100) comprising a piezo¬electric module (110), the piezo-electric module comprising at least one piezo-electric element (120), wherein the thermo-mechanical actuator is configured to: •o receive a thermal actuation signal (132) for controlling a thermal behaviour of the piezo-electric module, or •o provide a thermal sensing signal (132) representative of a thermal state of the piezo-electric module, and, wherein the thermo-mechanical actuator is configured to: •o receive a mechanical actuation (134) signal for controlling a mechanical behaviour of the piezo-electric module, or •o provide a mechanical sensing signal (134) representative of a mechanical state of the piezo-electric module.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: October 15, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Bas Jansen, Koen Martin Willem Jan Bos, Johannes Petrus Martinus Bernardus Vermeulen
  • A METHOD OF MONITORING A MEASUREMENT RECIPE AND ASSOCIATED METROLOGY METHODS AND APPARATUSES
    Publication number: 20240337954
    Abstract: Disclosed is a method of determining a reliability metric describing a reliability of metrology signal and/or a parameter of interest value derived therefrom and associated apparatuses. The method comprises obtaining a trained inference model for inferring a value for a parameter of interest from a measurement signal and one or more measurement signals and/or respective one or more values of a parameter of interest derived therefrom using said trained inference model. At least one reliability metric value is determined for the one or more measurement signals and/or respective one or more values of a parameter of interest, the reliability metric describing a reliability of one or more measurement signals and/or respective one or more values of a parameter of interest with respect to an accurate prediction space associated with the trained inference model.
    Type: Application
    Filed: June 10, 2022
    Publication date: October 10, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Giulio BOTTEGAL, Martijn JONGEN
  • Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
    Patent number: 12112260
    Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: October 8, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Lorenzo Tripodi, Patrick Warnaar, Grzegorz Grzela, Mohammadreza Hajiahmadi, Farzad Farhadzadeh, Patricius Aloysius Jacobus Tinnemans, Scott Anderson Middlebrooks, Adrianus Cornelis Matheus Koopman, Frank Staals, Brennan Peterson, Anton Bernhard Van Oosten
  • LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD
    Publication number: 20240329546
    Abstract: A system includes a support table having one or more protrusions and a pressure device. The one or more protrusions contact and support a substrate such that the substrate is suspended with respect to the support table. Sagging of the substrate when supported by the support table is based on a material and/or dimensions of the substrate. The pressure adjusts a pressure on a side of the substrate such that the sagging is reduced.
    Type: Application
    Filed: June 28, 2022
    Publication date: October 3, 2024
    Applicant: ASML Netherlands B.V.
    Inventor: Marcus Adrianus VAN DE KERKHOF
  • IMAGE DISTORTION CORRECTION IN CHARGED PARTICLE INSPECTION
    Publication number: 20240331115
    Abstract: An improved systems and methods for correcting distortion of an inspection image are disclosed. An improved method for correcting distortion of an inspection image comprises acquiring an inspection image, aligning a plurality of patches of the inspection image based on a reference image corresponding to the inspection image, evaluating, by a machine learning model, alignments between each patch of the plurality of patches and a corresponding patch of the reference image, determining local alignment results for the plurality of patches of the inspection image based on a reference image corresponding to the inspection image, determining an alignment model based on the local alignment results, and correcting a distortion of the inspection image based on the alignment model.
    Type: Application
    Filed: June 2, 2022
    Publication date: October 3, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Haoyi LIANG, Zhichao CHEN, Lingling PU, Fang-Cheng CHANG, Liangjiang YU, Zhe WANG
  • SYSTEMS AND METHODS FOR THERMALLY STABLE MOUNTING OF OPTICAL COLUMNS
    Publication number: 20240329548
    Abstract: Systems and methods are disclosed for stabilizing an optical column. One system can include an optical column; a frame configured to support the optical column, the frame having a first coefficient of thermal expansion (CTE); and a subframe configured to be coupled to the optical column in at least two places by a first anchor and a second anchor to stabilize the optical column against a displacement or a rotation caused by thermal expansion in the frame or the optical column, the subframe having a second CTE lower than the first CTE.
    Type: Application
    Filed: January 17, 2024
    Publication date: October 3, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Jasper WINTERS, Erwin John VAN ZWET, Marcus Johannes VAN DER LANS, Pieter Willem Herman DE JAGER, Emiel Anton VAN DE VEN
  • METHOD AND SYSTEM FOR ANOMALY-BASED DEFECT INSPECTION
    Publication number: 20240331132
    Abstract: Systems and methods for detecting a defect on a sample include receiving a first image and a second image associated with the first image; determining, using a clustering technique, N first feature descriptor(s) for L first pixel(s) in the first image and M second feature descriptor(s) for L second pixel(s) in the second image, wherein each of the L first pixel(s) is co-located with one of the L second pixel(s), and L, M, and N are positive integers; determining K mapping probability between a first feature descriptor of the N first feature descriptor(s) and each of K second feature descriptor(s) of the M second feature descriptor(s), wherein K is a positive integer; and providing an output for determining whether there is existence of an abnormal pixel representing a candidate defect on the sample based on a determination that one of the K mapping probability does not exceed a threshold value.
    Type: Application
    Filed: June 3, 2022
    Publication date: October 3, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Haoyi LIANG, Yani CHEN, Ming-Yang YANG, Yang YANG, Xiaoxia HUANG, Zhichao CHEN, Liangjiang YU, Zhe WANG, Lingling PU
  • Metrology method and associated computer product
    Patent number: 12105432
    Abstract: Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: October 1, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Narjes Javaheri, Maurits Van Der Schaar, Tieh-Ming Chang, Hilko Dirk Bos, Patrick Warnaar, Samira Bahrami, Mohammadreza Hajiahmadi, Sergey Tarabrin, Mykhailo Semkiv
  • Method and apparatus for monitoring beam profile and power
    Patent number: 12105036
    Abstract: A system and a method for monitoring a beam in an inspection system are provided. The system includes an image sensor configured to collect a sequence of images of a beam spot of a beam formed on a surface, each image of the sequence of images having been collected at a different exposure time of the image sensor, and a controller configured to combine the sequence of images to obtain a beam profile of the beam.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: October 1, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Jian Zhang, Ning Ye, DanJing Huang, Bin-Da Chan
  • SYSTEM AND METHOD FOR INSPECTION BY FAILURE MECHANISM CLASSIFICATION AND IDENTIFICATION IN A CHARGED PARTICLE SYSTEM
    Publication number: 20240319123
    Abstract: Apparatuses, systems, and methods for providing beams for classifying and identifying failure mechanisms associated with a sample of charged particle beam systems. In some embodiments, a method may include analyzing a first plurality of voltage contrast images of a sample to identify a plurality of defects; and analyzing a pattern of a subset of the plurality of defects to determine a failure mechanism for the subset of the plurality of defects.
    Type: Application
    Filed: August 16, 2022
    Publication date: September 26, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Achim WOESSNER, Younghoon SONG, Pioter NIKOLSKI, Yun A SUNG, Antonio CORRADI, Hermanus Adrianus DILLEN
  • METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE OR MORE STRUCTURES ON A SUBSTRATE
    Publication number: 20240319620
    Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
    Type: Application
    Filed: April 30, 2024
    Publication date: September 26, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus TINNEMANS, Arie Jeffrey DEN BOEF, Armand Eugene Albert KOOLEN, Nitesh PANDEY, Vasco Tomas TENNER, Willem Marie Julia Marcel COENE, Patrick WARNAAR
  • Actuator unit for positioning an optical element
    Patent number: 12099307
    Abstract: Disclosed is an actuator unit for positioning an optical element, comprising a first reluctance actuator comprising a first stator part and a first mover part separated by a gap in a first direction. The first mover part is constructed and arranged to be connected to the optical element and for moving the optical element. The first stator part is constructed and arranged to exert a magnetic force on the first mover part along a first line of actuation. The first mover part is movable relative to the first stator part in the first direction. The first stator part and the first mover part are constructed and arranged such that the first line of actuation is, in operational use, moving along with the first mover part in a second direction perpendicular to the first direction, for at least a predetermined movement range of the first mover part in the second direction.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: September 24, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Sjoerd Martijn Huiberts, René Josephus Johannes Van Der Meulen, Johannes Petrus Martinus Bernardus Vermeulen
  • Method for controlling a lithographic system
    Patent number: 12099306
    Abstract: A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.
    Type: Grant
    Filed: February 20, 2020
    Date of Patent: September 24, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Oscar Franciscus Jozephus Noordman, Antonius Theodorus Wilhelmus Kempen, Jan Bernard Plechelmus Van Schoot, Marinus Aart Van Den Brink
  • PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHARGED PARTICLE APPARATUS
    Publication number: 20240312756
    Abstract: Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.
    Type: Application
    Filed: May 24, 2024
    Publication date: September 19, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Jasper Hendrik GRASMAN, Niels Johannes Maria BOSCH, Patrick Peter Hubert Helena PHILIPS, Peter Paul HEMPENIUS, Joan SANS MERCADER, Gerardus Wilhelmus SARS, Hans BUTLER, Willem Henk URBANUS
  • A CONTAMINATION REDUCTION SYSTEM
    Publication number: 20240310742
    Abstract: A contamination reduction system for reducing contamination of a patterning system in a plasma environment, comprising: a support arranged to hold a patterning system in a radiation beam; a shutter configured to shield a portion of the radiation beam from the patterning system; and an electrode positioned between the shutter and the support, the electrode connected to a voltage source and configured to generate an electric field between the electrode and the patterning system held by the support.
    Type: Application
    Filed: December 15, 2021
    Publication date: September 19, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Vladimir KVON, Andrei Mikhailovich YAKUNIN, Marcus Adrianus VAN DE KERKHOF, Dmitry Igorevich ASTAKHOV
  • ELECTROMAGNETIC MOTOR SYSTEM, POSTION CONTROL SYSTEM, STAGE APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF DETERMINING A MOTOR-DEPENDENT COMMUTATION MODEL FOR AN ELECTROMAGNETIC MOTOR
    Publication number: 20240313684
    Abstract: The invention provides a method of determining a motor-dependent commutation model for an electromagnetic motor, whereby the electromagnetic motor comprises a first member comprising a coil array comprising at least M coils, and a second member comprising a magnet array configured to generate a spatially alternating magnetic field, whereby the first member and the second member are configured to displace relative to each other in N degrees of freedom, N<M, by supplying the at least M coils with respective at least M currents Im, thereby generating forces in the N degrees of freedom, the method comprising the steps of: obtaining a commutation model G for the electromagnetic motor, the general commutation model G providing a relationship between desired forces Fc in the N degrees of freedom and the at least M currents Im applied to the coil array by Im=G*Fc.
    Type: Application
    Filed: June 30, 2022
    Publication date: September 19, 2024
    Applicant: ASML Netherlands B.V.
    Inventor: Hans BUTLER
  • Apparatus of plural charged-particle beams
    Patent number: 12087541
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: September 10, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Detection apparatus for simultaneous acquisition of multiple diverse images of an object
    Patent number: 12086973
    Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.
    Type: Grant
    Filed: April 2, 2020
    Date of Patent: September 10, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Teunis Willem Tukker, Arie Jeffrey Den Boef, Nitesh Pandey, Marinus Petrus Reijnders, Ferry Zijp