Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

Abstract: Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.

Abstract: A clamp assembly is disclose, the clamp assembly comprising a clamp (50) configurable to clamp a support member (110) to a lower base surface (49) of the clamp by electrostatic adhesion, and an arrangement configurable to direct a gas to the lower base surface (49) of the clamp. The arrangement is configurable to humidify the gas by exposing the gas to a liquid. Also disclosed is a method of discharging a lower base surface of a clamp, The method comprises the steps of humidifying a gas by exposing the gas to a liquid, and directing the humidified gas to a lower base surface of the clamp.

Abstract: A method for determining a target feature in a model of a patterning process based on local electric fields estimated for the patterning process. The method includes obtaining a mask stack region of interest. The mask stack region of interest has one or more characteristics associated with propagation of electromagnetic waves through the mask stack region of interest. The mask stack region of interest includes the target feature. The method includes estimating a local electric field based on the one or more characteristics associated with the propagation of electromagnetic waves through the mask stack region of interest. The local electric field is estimated for a portion of the mask stack region of interest in proximity to the target feature. The method includes determining the target feature based on the estimated local electric field.

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.

Abstract: Disclosed is a method of improving a measurement of a parameter of interest. The method comprises obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of said one or more targets and a measurement condition used to measure that target and asymmetry metric data relating to asymmetry for said one or more targets. A respective relationship is determined for each of said measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over said measurement combinations. These relationships are used to improve a measurement of the parameter of interest.

Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane includes metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.

Abstract: The invention provides a method for positioning a sensor over a target on a moveable object, comprising the following steps: a. moving the object to move the target to a desired position, b. moving the sensor in a direction towards a measured momentary position of the target, c. when the sensor is over the target. moving the sensor along with the target to the desired position of the target.

Abstract: Apparatuses, systems, and methods for providing beams for defect detection and defect location identification associated with a sample of charged particle beam systems. In some embodiments, a method may include obtaining an image of a sample; determining defect characteristics from the image; generating an updated image based on the determined defect characteristics and the image; and aligning the updated image with a reference image.

Abstract: Systems with valves that increase cycle life and reduce particle generation. Embodiments may include a first movable member, a second movable member, and a third movable member; a first link coupled to the first movable member and the second movable member such that when the second movable member is moved laterally and the third movable member is stopped, the first link exerts a force on the first movable member that causes the first movable member to move towards a surface and press against the surface to form a vacuum seal; and a second link coupled to the first movable member and the third movable member such that when the first link causes the first movable member to move, the second link exerts a force on the first movable member that limits movement of the first movable member such that the first movable member moves towards the surface with limited offset.

Abstract: A method to determine a metrology contribution from statistically independent sources, the method including providing a plurality of contributions from statistically independent sources obtained at a plurality of measurement settings, and determining a metrology contribution from the contributions wherein the metrology contribution is the contribution having least dependence as a function of the measurement settings.

Abstract: Systems and methods for image analysis include obtaining a plurality of simulation images and a plurality of non-simulation images both associated with a sample under inspection, at least one of the plurality of simulation images being a simulation image of a location on the sample not imaged by any of the plurality of non-simulation images; and training an unsupervised domain adaptation technique using the plurality of simulation images and the plurality of non-simulation images as inputs to reduce a difference between first intensity gradients of the plurality of simulation images and second intensity gradients of the plurality of non-simulation images.

Abstract: An optical system for directing first and second laser pulses along an optical axis to a target to generate extreme ultraviolet radiation from said target. The optical system comprises a first optical component configured to redistribute a first laser pulse to form a shaped laser pulse having a hollow region. The optical system comprise a second optical component configured to focus the shaped laser pulse toward the target. The optical system comprises a third optical component configured to focus a second laser pulse toward the target within the hollow region of the shaped laser pulse. The first, second and third optical components are coaxially arranged on the optical axis.

Abstract: A method of determining aberrations in images obtained by a charged-particle beam tool, comprising: a) obtaining two or more images of a sample, wherein each image is obtained at a known relative difference in a measurement condition of the charged-particle beam tool; b) selecting an estimated aberration parameter for the aberrations of a probe profile representing the charged-particle beam used by the charged-particle beam tool; c) evaluating an error function indicative of the difference between the two or more images and two or more estimated images that are a function of the estimated aberration parameter and the known relative difference in the measurement condition; d) updating the estimated aberration parameter; e) performing processes c) and d) iteratively; f) determining the final aberration parameter as the estimated aberration parameter that provides the smallest value of the error function.

Abstract: A method for evaluating images of a printed pattern. The method includes obtaining a first averaged image of the printed pattern, where the first averaged image is generated by averaging raw images of the printed pattern. The method also includes identifying one or more features of the first averaged image. The method further includes evaluating the first averaged image, using an image quality classification model and based at least on the one or more features. The evaluating includes determining, by the image quality classification model, whether the first averaged image satisfies a metric.

Abstract: Apparatuses, systems, and methods for multi-modal operations of a multi-beam inspection system are disclosed. An apparatus for generating multi-modal beamlets may include an aperture array which includes a first group of apertures having a first size and a second group of apertures having a second size different from the first size, the second group of apertures adjoining the first group of apertures, in which the first group of apertures and the second group of apertures are in different pass-or-block statuses. A multi-beam apparatus of multi-modal inspection operations may include the aforementioned apparatus, a source configured to emit charged particles, a condenser system configured to set a projection area of the charged particles, and circuitry for controlling the first and second groups of apertures.

Abstract: An inspection apparatus includes a radiation source, an optical system, and a detector. The radiation source generates a beam of radiation. The optical system directs the beam along an optical axis and toward a target so as to produce scattered radiation from the target. The optical system includes a beam displacer including four reflective surfaces having a spatial arrangement. The beam displacer receives the beam along the optical axis, performs reflections of the beam so as to displace the optical axis of the beam, rotates to shift the displaced optical axis, and preserves polarization of the beam such that a polarization state of the beam along the deflected optical axis is invariant to the rotating based on the spatial arrangement of the four reflective surfaces. The detector receives the scattered radiation to generate a measurement signal based on the received scattered radiation.

Abstract: A broadband radiation source device configured for generating broadband output radiation upon receiving substantially linearly polarized input radiation, the source device including: a hollow-core photonic crystal fiber; at least a first polarization element operable to impose a substantially circular or elliptical polarization on the input radiation prior to being received by the hollow-core photonic crystal fiber; and a second polarization element operable in combination with the first polarization element to impose a substantially elliptical polarization on the input radiation, wherein the second polarization element and the first polarization element are oriented such that the elliptical polarization compensates at least partially for birefringence of the hollow-core photonic crystal fiber.

Abstract: A method of determining an overlay measurement of a substrate includes: injecting charge into a charge injection element of the substrate; determining a first capacitance of a first pair of elements and a second capacitance of a second pair of elements; and determining a capacitance ratio based on the first capacitance and the second capacitance. The overlay measurement may be determined based on the capacitance ratio, which may indicate an imbalance.

Abstract: A metrology system includes a light beam metrology apparatus configured to sense one or more aspects of an amplified light beam and to make adjustments to the amplified light beam based on the sensed one or more aspects; a target metrology apparatus configured to measure one or more properties of a modified target after a target has interacted with the amplified light beam, and to determine a moment when the modified target achieves a reference calibration state; and a control apparatus configured to: receive the reference calibration state and the moment at which the reference calibration state is achieved from the target metrology apparatus; determine a light beam calibration state of the amplified light beam based on the received reference calibration state and the moment at which the reference calibration state is achieved; and provide the light beam calibration state to the light beam metrology apparatus.