Abstract: Methods of determining, and using, a patterning process model that is a machine learning model. The process model is trained partially based on simulation or based on a non-machine learning model. The training data may include inputs obtained from a design layout, patterning process measurements, and image measurements.
Type:
Application
Filed:
February 20, 2018
Publication date:
January 23, 2020
Applicant:
ASML NETHERLANDE B.V.
Inventors:
Ya LUO, Yu CAO, Jen-Shiang WANG, Yen-Wen LU