Patents Assigned to ASML Nethlerlands B.V.
  • Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
    Publication number: 20070263197
    Abstract: A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.
    Type: Application
    Filed: May 9, 2006
    Publication date: November 15, 2007
    Applicant: ASML Nethlerlands B.V.
    Inventors: Bernardus Antonius Luttikhuis, Henrikus Cox, Erik Loopstra, Engelbertus Antonius Van Der Pasch, Harmen Van Der Schoot