Patents Assigned to ASML NITHERLANDS B.V.
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050002004
    Abstract: Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.
    Type: Application
    Filed: June 14, 2004
    Publication date: January 6, 2005
    Applicant: ASML NITHERLANDS B.V.
    Inventors: Aleksey Kolesnychenko, Jan Van Der Werf