Patents Assigned to Aspect Systems Inc.
  • Partial clean fluorine thermal cleaning process
    Patent number: 5868852
    Abstract: A method for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with a thermally activated source of fluorine, such as nitrogen trifluoride, at an elevated temperature, typically at the process operation temperature, wherein the cleaning is terminated prior to complete cleaning and removal of undesired substances allowing rapid restart of fabrication equipment so cleaned.
    Type: Grant
    Filed: February 18, 1997
    Date of Patent: February 9, 1999
    Assignees: Air Products and Chemicals, Inc., Aspect Systems, Inc.
    Inventors: Andrew David Johnson, Richard Vincent Pearce, Charles Anthony Schneider, Timothy Wayne McGaughey
  • Diluted nitrogen trifluoride thermal cleaning process
    Patent number: 5714011
    Abstract: A method for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated diluted nitrogen trifluoride at elevated temperatures, typically at the process operation temperature, wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned.
    Type: Grant
    Filed: February 17, 1995
    Date of Patent: February 3, 1998
    Assignees: Air Products and Chemicals Inc., Aspect Systems Inc., GEC Inc.
    Inventors: Charles Anthony Schneider, Ronald James Gibson, Bruce Alan Huling, George Martin Engle