Abstract: A closable enclosure for rapid thermal processing of semiconductor wafers is presented, wherein the closable enclosure has an enclosed volume less than 10 times the volume of the wafer, and wherein the closable enclosure may closed about the wafer while the closable enclosure is surrounded by the process gas.
Type:
Grant
Filed:
April 12, 1996
Date of Patent:
November 17, 1998
Assignee:
AST Electronik
Inventors:
Guenter Kaltenbrunner, Zsolt Nenyei, Helmut Sommer
Abstract: A method and apparatus for measuring the emission coefficient of a semiconductor material for light of wavelength .lambda. having photon energy less than the semiconductor bandgap energy is introduced. The reflection coefficient for the light of wavelength .lambda. is measured while the semiconductor material is being irradiated with sufficient light having photon energy greater than the bandgap energy that the semiconductor material transmits little light of wavelength .lambda., and the emission coefficient is calculated from the measured reflection coefficient. The temperature of the semiconductor material can be calculated from the emission coefficient and the measured intensity of the thermally emitted radiation of wavelength .lambda..
Type:
Grant
Filed:
April 10, 1996
Date of Patent:
March 10, 1998
Assignee:
AST Electronik, GmbH
Inventors:
Michael Maurer, Wilfried Lerch, Alexander Gschwandtner