Abstract: A method and apparatus for optical pyrometry in a Rapid Thermal Processing (RTP) System, whereby the radiation used to heat the object to be processed in the RTP system is in part specularly reflected from specularly reflecting surfaces and is incident on the object with a particular angular distribution, and the thermal radiation from the object is measured at an angles different from the angle where the incident radiation specularly reflected from the surface of the object is a maximum.
Type:
Grant
Filed:
March 28, 1995
Date of Patent:
May 13, 1997
Assignee:
AST Elekronik GmbH
Inventors:
Zsolt Nenyei, Andreas Tillmann, Heinrich Walk
Abstract: A reaction chamber for a Rapid Thermal Processing (RTP) system contains an aperture to allow introduction and removal of the object to be processed. The cross sectional area of the aperture is significantly less than the cross sectional area of the reaction chamber. A method of flushing the reaction chamber, using a short time laminar flow of the flush gas, is used in combination with the aperture to increase the throughput of the RTP system.
Type:
Grant
Filed:
February 13, 1995
Date of Patent:
December 3, 1996
Assignee:
AST Elekronik
Inventors:
Zsolt Nenyei, Helmut Merkle, Andreas Tillmann
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