Abstract: Provided is a system for stabilizing a flow of gas introduced into a sensor, wherein, in connection with manufacturing equipment comprising a process chamber, a process chamber vacuum pump installed to remove internal gas of the process chamber, and a sensor device configured to be able to receive the internal gas of the process chamber through a sensor connecting pipe and to detect components thereof, the system comprises a sensor connecting pipe and a bypass pipe branching off from the sensor connecting pipe such that a part of the gas can be directly discharged to the outside without being introduced into the sensor, and the system is accordingly configured to stably provide the sensor device with a part of the internal gas within a predetermined range per time, regardless of a change in the pressure state of the process chamber.
Type:
Grant
Filed:
January 15, 2021
Date of Patent:
November 18, 2025
Assignees:
ATIK CO., LTD., ATONARP INC.
Inventors:
Young Ho Hong, Hyun Sik Choi, Ki Woo Hong, Hirofumi Nagao, Shinichi Miki