Abstract: The disclosure relates to devices, systems and methods for forming multi-layer films. Specifically, the disclosure relates to devices, systems and methods for forming multi-layered film using a multifunctional nozzle, enabling materials deposition using Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), and Sequential Infiltration Synthesis (SIS), all within the same system.
Type:
Grant
Filed:
October 16, 2024
Date of Patent:
January 6, 2026
Assignee:
ATLANT 3D, ApS
Inventors:
Samir Hassan Mahmoud Ahmed Sadek, Mira Baraket, Maksym Plakhotnyuk