Patents Assigned to ATLANT 3D, ApS
  • Patent number: 12515403
    Abstract: The disclosure relates to devices, systems and methods for forming multi-layer films. Specifically, the disclosure relates to devices, systems and methods for forming multi-layered film using a multifunctional nozzle, enabling materials deposition using Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), and Sequential Infiltration Synthesis (SIS), all within the same system.
    Type: Grant
    Filed: October 16, 2024
    Date of Patent: January 6, 2026
    Assignee: ATLANT 3D, ApS
    Inventors: Samir Hassan Mahmoud Ahmed Sadek, Mira Baraket, Maksym Plakhotnyuk