Patents Assigned to ATLANT 3D Nanosystems ApS
  • Atomic layer process printer
    Patent number: 12049700
    Abstract: The invention relates to an atomic layer process printer for material deposition, etching and/or cleaning on an atomic scale in a selective area. The invention further relates to a method for material deposition, etching and/or cleaning on an atomic scale in a selective area using the atomic layer process printer.
    Type: Grant
    Filed: June 3, 2020
    Date of Patent: July 30, 2024
    Assignee: ATLANT 3D Nanosystems ApS
    Inventors: Maksym Plakhotnyuk, Ole Hansen, Boisen Anja, Tomas Rindzevicius, Ivan Kundrata, Karol Fröhlich, Julien Bachmann