Patents Assigned to ATMI EcoSys Corporation
  • Patent number: 6030591
    Abstract: A process for recovery of fluorocompound gas from an effluent gas stream containing the fluorocompound gas and other gas components, in which at least one of the other gas components is removed, e.g., by oxidation or contacting of the effluent stream with a dry material such as an adsorbent or scrubber medium, to yield a first effluent gas mixture containing the fluorocompound gas. The fluorocompound gas is removed from the first effluent gas mixture and recovered as a concentrated fluorocompound gas, by a process such as cryogenic processing, membrane separation, and/or adsorption.
    Type: Grant
    Filed: January 2, 1998
    Date of Patent: February 29, 2000
    Assignee: ATMI Ecosys Corporation
    Inventors: Glenn M. Tom, H. Eric Fisher, W. Karl Olander
  • Patent number: 5955037
    Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.
    Type: Grant
    Filed: December 31, 1996
    Date of Patent: September 21, 1999
    Assignee: ATMI Ecosys Corporation
    Inventors: Mark Holst, Kent Carpenter, Scott Lane, Prakash V. Arya
  • Patent number: 5935283
    Abstract: A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-Forming gas stream to a gas processing system. The structure is composed of a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumscribing the gas-permeable wall to define an annular gas reservoir therebetween. The clog-resistant inlet structure is constructed, arranged, and operated so as to introduce a gas into the annular gas reservoir during the flow of the particulate solids-containing and/or solids-forming gas stream to a gas processing system through such inlet structure at a pressure sufficient to combat the deposition or formation of solids on the interior surface of the gas-permeable wall. The inlet structure may further optionally include a downstream annular section in which the wall surface bounding the gas stream is blanketed with a falling liquid film, to combat solids deposition or formation on the blanketed wall surface.
    Type: Grant
    Filed: May 16, 1997
    Date of Patent: August 10, 1999
    Assignee: ATMI Ecosys Corporation
    Inventors: Joseph D. Sweeney, Prakash V. Arya, Mark Holst, Scott Lane
  • Patent number: 5882366
    Abstract: An apparatus for conveying a process gas stream from an upstream source to a downstream treatment unit, including a manifold receiving gas from the upstream source, including first and second valved inlet lines which are alternatingly employed to flow gas to a downstream process. The manifold is arranged so that one of such lines is actively flowing gas from the upstream source to the downstream process, while the other is blocked by closure of the valve therein and is undergoing regeneration. A pressurized water source is coupled with the manifold, by valved water flow lines to each of the first and second inlet lines, with the water flow line valves being selectively openable or closeable to establish or discontinue flow of pressurized water therethrough, respectively. Cycle timer control means are employed to control the operation of the manifold and valves, for water cleaning of the off-stream inlet line.
    Type: Grant
    Filed: June 6, 1997
    Date of Patent: March 16, 1999
    Assignees: ATMI Ecosys Corporation, Hewlett-Packard Corporation
    Inventors: Mark Holst, Patrick Balliew
  • Patent number: 5873388
    Abstract: A pressure damping system for damping pressure perturbations incident to switching of switchable flow control means in a fluid flow circuit. The pressure surge damping system comprises a throttle valve in the circuit, with the throttle valve and switchable flow control means being constructed and arranged for selective adjustment of the throttle valve when the switchable flow control means is switched, to attenuate pressure perturbations incident to switching of the switchable flow control means. The pressure surge damping system of the invention may be employed in a multi-vessel oxidation system for the treatment of semiconductor effluent gas, or in other applications involving periodic or cyclic switched flows which generate an upstream-propagating pressure wave detrimental to an upstream process facility.
    Type: Grant
    Filed: June 7, 1996
    Date of Patent: February 23, 1999
    Assignee: ATMI EcoSys Corporation
    Inventor: Kent H. Carpenter
  • Patent number: 5851293
    Abstract: A flow stabilization system for damping pressure variations in a process discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, said system comprising a motive fluid driver constructed and arranged to receive the effluent gas stream from the process, and means for sensing a flow characteristic of the effluent gas stream and responsively adjusting the flow of the effluent gas stream to damp pressure fluctuations in the process.
    Type: Grant
    Filed: September 6, 1996
    Date of Patent: December 22, 1998
    Assignee: ATMI Ecosys Corporation
    Inventors: Scott Lane, Dinesh Shah, Ronald Colman, Liam R. Heading, Eric Simpson
  • Patent number: 5846275
    Abstract: A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system, including: a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumscribing the gas-permeable wall to define an annular gas reservoir therebetween; and a flow passage for introducing a gas into the annular gas reservoir during the flow of the particulate solids-containing and/or solids-forming gas stream to a gas processing system through such inlet structure at a pressure sufficient to cause the gas to permeate through the gas-permeable wall to combat the deposition or formation of solids on the interior surface of the gas-permeable wall. The inlet structure may further optionally include a downstream annular section in which the wall surface bounding the gas stream is blanketed with a falling liquid film, to combat solids deposition or formation on the blanketed wall surface.
    Type: Grant
    Filed: December 31, 1996
    Date of Patent: December 8, 1998
    Assignee: ATMI EcoSys Corporation
    Inventors: Scott Lane, Mark Holst
  • Patent number: 5833888
    Abstract: A gas/liquid interface structure for transport of a gas stream from an upstream source of same to a downstream processing unit, comprising first and second flow passage members defining an annular volume therebetween, with the second flow passage member extending downwardly to a lower elevation than the lower end of the first flow passage member, with an outer wall member enclosingly circumscribing the second flow passage member and defining therewith an enclosed interior annular volume, and with a liquid flow port in the outer wall member for introducing liquid into the enclosed interior annular volume. The second flow passage member includes an upper liquid-permeable portion in liquid flow communication with the enclosed interior annular volume, whereby liquid from such volume can "weep" through the permeable portion and form a falling liquid film on interior surface portions of the second flow passage member, as a protective liquid interface for the second flow passage member.
    Type: Grant
    Filed: December 31, 1996
    Date of Patent: November 10, 1998
    Assignee: ATMI Ecosys Corporation
    Inventors: Prakash V. Arya, Mark Holst, Kent Carpenter, Scott Lane
  • Patent number: 5779998
    Abstract: A process for recovery of halocarbons from a gas mixture containing the halocarbon and acid gas components comprises the steps of contacting the gas mixture with a dry scrubber to remove the acid gas components from the gas mixture and yield a first effluent gas mixture containing the halocarbon. The first effluent gas mixture is contacted with an adsorbent which is selective for the halocarbon component of the first effluent gas mixture to adsorb the halocarbon component and yield a second effluent gas. The adsorbed halocarbon is recovered by desorbing same from the adsorbent. The process of contacting with adsorbent can be carried out in at least two adsorbent beds joined at inlet and outlet ends thereof to gas feed and gas discharge manifolds, respectively.
    Type: Grant
    Filed: December 5, 1996
    Date of Patent: July 14, 1998
    Assignee: ATMI EcoSys Corporation
    Inventor: Glenn M. Tom
  • Patent number: 5777058
    Abstract: Scavengers for removing acidic or corrosive gaseous components from semiconductor process effluents comprising a metallic macromer comprising a coordinated complex of (i) metal coordination atoms linked to (ii) oxomeric moieties selected from the group consisting of carbonate, sulfite, carboxylate, and silicate, and methods for synthesizing these scavengers. A method for cleaning an exhaust gas containing least one corrosive or acidic gaseous component selected from the group consisting of hydrogen halide, chlorine, boron trihalide, thionyl chloride, and tungsten hexafluoride, which comprises contacting the exhaust gas with the metallic macromer scavenger compositions.
    Type: Grant
    Filed: May 29, 1996
    Date of Patent: July 7, 1998
    Assignee: ATMI Ecosys Corporation
    Inventor: H. Eric Fischer
  • Patent number: 5676712
    Abstract: A flashback protection apparatus and method for suppressing deflagration of a deflagration-susceptible gas in a flow system in which the deflagration-susceptible gas is flowed. The method of the invention comprises monitoring the combustible gas to detect deflagration therein, and upon detection of a deflagration event producing a propagating flame front, opposedly directing at the propagating flame front a pressurized non-flammable gas in a sufficient volume and at a sufficient velocity to provide a non-flammable gas flow having a momentum at least opposedly equal to momentum of the propagating flame front and the associated accelerated combustible gas undergoing deflagration.
    Type: Grant
    Filed: May 16, 1995
    Date of Patent: October 14, 1997
    Assignee: ATMI Ecosys Corporation
    Inventor: Lawrence B. Anderson
  • Patent number: 5622682
    Abstract: A process for recovery of halocarbons from a gas mixture containing the halocarbon and acid gas components comprises the steps of contacting the gas mixture with a dry scrubber to remove the acid gas components from the gas mixture and yield a first effluent gas mixture containing the halocarbon. The first effluent gas mixture is contacted with an adsorbent which is selective for the halocarbon component of the first effluent gas mixture to adsorb the halocarbon component and yield a second effluent gas. The adsorbed halocarbon is recovered by desorbing same from the adsorbent. The process of contacting with adsorbent can be carried out in at least two adsorbent beds joined at inlet and outlet ends thereof to gas feed and gas discharge manifolds, respectively.
    Type: Grant
    Filed: February 27, 1995
    Date of Patent: April 22, 1997
    Assignee: ATMI EcoSys Corporation
    Inventor: Glenn M. Tom