Patents Assigned to ATMI Taiwan Co., Ltd.
  • NI:NIGE:GE SELECTIVE ETCH FORMULATIONS AND METHOD OF USING SAME
    Publication number: 20160314990
    Abstract: Compositions and methods for selectively removing unreacted metal material (e.g., unreacted nickel) relative to metal germanide (e.g., NiGe), metal-III-V materials, and germanium from microelectronic devices having same thereon. The compositions are substantially compatible with other materials present on the microelectronic device such as low-k dielectrics and silicon nitride.
    Type: Application
    Filed: December 16, 2014
    Publication date: October 27, 2016
    Applicants: ENTEGRIS, INC., ATMI TAIWAN CO., LTD.
    Inventors: Steven BILODEAU, Jeffrey A. BARNES, Emanuel COOPER, Hsing-Chen WU, Sheng-Hung TU, Thomas PARSON, Min-chieh YANG
  • AQUEOUS CLEAN SOLUTION WITH LOW COPPER ETCH RATE FOR ORGANIC RESIDUE REMOVAL IMPROVEMENT
    Publication number: 20150114429
    Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include at least one quaternary base, at least one amine, at least one corrosion inhibitor, and at least one solvent. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device while being compatible with barrier layers.
    Type: Application
    Filed: May 17, 2013
    Publication date: April 30, 2015
    Applicants: ATMI Taiwan Co., Ltd., Advanced Technology Materials, Inc.
    Inventors: Shrane Ning Jenq, Karl E. Boggs, Jun Liu, Nicole Thomas