Abstract: Provided are an angular velocity sensor with improved reliability by preventing an electric short circuit resulting from etching debris left on the bottom electrode after the etching of the conductive layers, and a method for manufacturing the angular velocity sensor. The drive electrode unit, the monitor electrode unit and the sensing electrode unit are each provided with bottom electrode (29) formed on substrate (33) having the shape of a tuning fork, piezoelectric film (30) made of piezoelectric material and formed on bottom electrode (29), and top electrode (31) formed on piezoelectric film (30). Ends (31T) of top electrode (31) are located inside ends (30T) of piezoelectric film (30) so as to expose ends (30T) of piezoelectric film (30) beyond top electrode (31), thereby forming exposed parts (32). When exposed parts (32) have a thickness of âtâ, piezoelectric film (30) is made to have an exposed width (L) of not less than 0.3 t.
Type:
Application
Filed:
June 23, 2005
Publication date:
December 7, 2006
Applicant:
ATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Abstract: A base layer, which is supposed to be burnt off by baking, is formed on an unbaked member such as ceramic green sheet or laminated ceramic green sheets. This base layer improves ink acceptability of the unbaked ceramic member particularly for low viscosity ink such as jet-ink, and prevents oozing, draining, uneven thickness. This structure thus allows the inkjet to form a precise pattern. The base layer is burnt off at the baking step in the manufacturing process of electronic components, thus it does not adversely affect the reliability of the electronic component.
Abstract: A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2 and, and an acid generator:
wherein R1 and R3 are the same or different and are a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group or an alkyl group including a fluorine atom; R2 is an atom or a group that is not released by an acid and is selected from the group consisting of a hydrogen atom, an alkyl group, a cyclic aliphatic group, an aromatic group, a heterocycle, an ester group and an ether group; R4 is a protecting group released by an acid; m is an integer of 0 through 5; and a and b satisfy 0<a<1, 0<b<1 and 0<a+b≦1.