Abstract: A system and method of non-contact measurement of the dopant content of semiconductor material by reflecting infrared (IR) radiation off of the material and splitting the radiation into two beams, passing each beam through pass band filters of differing wavelength ranges, comparing the level of energy passed through each filter and calculating the dopant content by referencing a correlation curve made up of known wafer dopant content for that system.
Type:
Grant
Filed:
May 3, 2011
Date of Patent:
September 9, 2014
Assignee:
Aurora Control Technologies Inc.
Inventors:
E. Michael Heaven, Gordon Matthew Deans, Kenneth Cadien, Stephen Warren Blaine