Abstract: A housing contains a sump located below a partition wall having an opening which communicates the sump with a work receiving chamber above the partition wall. An upper condenser is provided in said chamber and a lower condenser in said sump. A chilled coil is located in the chamber above the elevation of the upper condenser but below the upper lip of the housing. Between the upper lip of the housing and the chilled coil, there is provided a vapor discharge port.

Abstract: Product cleaning apparatus having a treatment chamber provided with unheated spray cleaning zone and a sump separated by a wall and a closure member which cooperates with the wall so that the spray cleaning zone may be isolated from the sump. During such isolation of the sump and the spray cleaning zone, solvent vapors are removed to thereby facilitate introduction or removal of work into the chamber while minimizing solvent losses to the atmosphere and minimizing exposure of workers to solvent vapors.

Abstract: Cleaning apparatus such as a degreaser tank is provided with a vapor zone divided into upper and lower portions by a wall and a closure member which cooperates with the wall so that the upper and lower portions of the vapor zone may be isolated from one another. During such isolation of the upper and lower portions of the vapor zone, vapors from the upper portion are removed to thereby facilitate introduction or removal of work pieces into the upper portion of the vapor zone while minimizing solvent losses to the atmosphere and minimizing exposure of workers to solvent vapors.

Abstract: Solvent is vaporized from a work product as the product moves through a process which may be a heated chamber. The vaporized solvent is withdrawn from the chamber and passed through a chiller to recover a portion of the vapor. The output from the chiller is then passed through an adsorber to remove the remainder of the solvent.