Patents Assigned to AWT ADVANCED WET TECHNOLOGIES GMBH
  • METHOD AND APPARATUS FOR TREATING AT LEAST ONE SUBSTRATE IN A LIQUID MEDIUM
    Publication number: 20150083171
    Abstract: A method for treating at least one substrate (15), particularly wafers, in a liquid medium (3). In a first step, the substrate (15) is lifted in the liquid medium (3) until the substrate (15) is at least partially lifted out of the liquid medium (3) and, in a second step, is passed on at least one point protruding out of the liquid medium (3).
    Type: Application
    Filed: April 26, 2013
    Publication date: March 26, 2015
    Applicant: AWT ADVANCED WET TECHNOLOGIES GMBH
    Inventors: Hans Hauger, Werner Schulz