Patents Assigned to AZ ELECTRONICS MATERIALS (LUXEMBOURG) S.A.R.L.
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Patent number: 11269255Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.Type: GrantFiled: March 27, 2020Date of Patent: March 8, 2022Assignees: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Yuki Hirayama, Tadashi Kishimoto, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi, Toshiaki Nonaka
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Patent number: 10927220Abstract: The present invention relates to silazane-siloxane random copolymers as well as their production and their uses, particularly in LEDs.Type: GrantFiled: January 19, 2017Date of Patent: February 23, 2021Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Ralf Grottenmueller, Abraham Casas Garcia-Minguillan, Fumio Kita
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Patent number: 10822459Abstract: The present invention relates to a formulation suitable for the preparation of a highly refractive encapsulation material with good barrier properties towards water vapor for an LED, to an encapsulation material for an LED having a high refractive index and good barrier properties towards water vapor which is obtainable from said formulation and to a light emitting device (LED) comprising said encapsulation material. The formulation comprises a polymer comprising a first repeating unit U1 and a second repeating unit U2; and a surface-modified nanoparticle, wherein the surface-modified nanoparticle does not contain any zirconium dioxide.Type: GrantFiled: July 14, 2017Date of Patent: November 3, 2020Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Ralf Grottenmueller, Abraham Casas Garcia-Minguillan, Fumio Kita, Dieter Wagner
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Publication number: 20200319557Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.Type: ApplicationFiled: March 27, 2020Publication date: October 8, 2020Applicants: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Yuki HIRAYAMA, Tadashi KISHIMOTO, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Toshiaki NONAKA
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Publication number: 20200255599Abstract: The present invention relates to silazane-siloxane random copolymers as well as their production and their uses, particularly in LEDs.Type: ApplicationFiled: January 19, 2017Publication date: August 13, 2020Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Ralf GROTTENMUELLER, Abraham CASAS GARCIA-MINGUILLAN, Fumio KITA
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Patent number: 10719013Abstract: [Problem] To provide a material, which is a composition for a black matrix, and which is suitable for a display device structure having high luminance and suitable for producing a black matrix having high heat resistance and high light shielding properties. [Means for Solution] To use a composition for a black matrix comprising (I) a siloxane polymer having specific repeating unit(s), (II) a silanol condensation catalyst, (III) a black colorant, and (IV) a solvent.Type: GrantFiled: August 16, 2017Date of Patent: July 21, 2020Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Toshiaki Nonaka, Atsuko Noya
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Publication number: 20200181332Abstract: The present invention relates to a formulation suitable for the preparation of a highly refractive encapsulation material with good barrier properties towards water vapor for an LED, to an encapsulation material for an LED having a high refractive index and good barrier properties towards water vapor which is obtainable from said formulation and to a light emitting device (LED) comprising said encapsulation material. The formulation comprises a polymer comprising a first repeating unit U1 and a second repeating unit U2; and a surface-modified nanoparticle, wherein the surface-modified nanoparticle does not contain any zirconium dioxide.Type: ApplicationFiled: July 14, 2017Publication date: June 11, 2020Applicant: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Ralf GROTTENMUELLER, Abraham CASAS GARCIA-MINGUILLAN, Fumio KITA, Dieter WAGNER
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Patent number: 10678134Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.Type: GrantFiled: August 30, 2016Date of Patent: June 9, 2020Assignees: MERCK PATENT GMBH, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Yuki Hirayama, Tadashi Kishimoto, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi, Toshiaki Nonaka
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Reverse pattern formation composition, reverse pattern formation method, and device formation method
Patent number: 10670969Abstract: [Problem] To provide a composition, which is a reverse pattern formation composition comprising an aqueous solvent having little influence on a resist pattern, and which is excellent in flatness and filling properties after coating and has excellent etching resistance. Furthermore, a method for forming a pattern using the same is provided. [Means for Solution] A reverse pattern formation composition comprising a polysiloxane compound comprising a repeating unit having a nitrogen-containing group and a solvent comprising water, and a method for forming a fine pattern using the same.Type: GrantFiled: July 3, 2017Date of Patent: June 2, 2020Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Xiaowei Wang, Tatsuro Nagahara -
Patent number: 10656522Abstract: The present invention relates to a shrink material composition for fattening a resist pattern prepared from a negative-tone lithography process, comprising at least one polymer and at least one organic solvent, wherein the at least one polymer comprises at least one structural unit of a nitrogen heteroaromatic ring system.Type: GrantFiled: November 2, 2016Date of Patent: May 19, 2020Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventor: Xiaowei Wang
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Patent number: 10620538Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.Type: GrantFiled: February 3, 2016Date of Patent: April 14, 2020Assignees: Sakai Display Products Corporation, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Nobutake Nodera, Akihiro Shinozuka, Shinji Koiwa, Masahiro Kato, Takao Matsumoto, Takashi Fuke, Daishi Yokoyama, Katsuto Taniguchi
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Patent number: 10606173Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.Type: GrantFiled: March 23, 2017Date of Patent: March 31, 2020Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Megumi Takahashi, Daishi Yokoyama, Naofumi Yoshida, Katsuto Taniguchi, Masahiro Kuzawa
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Patent number: 10563093Abstract: [Object] To provide a polysilazane-containing composition for forming a film. In order to form a dense and processable siliceous film, the composition is intended to be employed in a two-step conversion process comprising the steps of: forming a film having a dry surface from the composition provided that the conversion in to the siliceous substance proceeds insufficiently; and then subjecting the film to secondary processing. [Means] The present invention provides a polysilazane-containing film-forming composition comprising a particular amine compound, a polysilazane compound, and a solvent; and the invention also provides a process for forming a siliceous substance. In the process, the composition is applied to coat a substrate and thereafter converted into the siliceous substance. The particular amine compound has two amine groups, and the amine groups have at least one phenyl-substituted hydrocarbon group.Type: GrantFiled: April 28, 2017Date of Patent: February 18, 2020Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Yoshio Nojima, Masakazu Kobayashi
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Patent number: 10509319Abstract: The present invention relates to a photosensitive composition comprising at least one nanosized fluorescent material and polysiloxane, to a color conversion film, and to a use of the color conversion film in an optical device. The invention further relates to an optical device comprising the color conversion film and a method for preparing the color conversion film and the optical device.Type: GrantFiled: February 5, 2016Date of Patent: December 17, 2019Assignees: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Masayoshi Suzuki, Tadashi Kishimoto, Yuki Hirayama, Stephan Dertinger, Toshiaki Nonaka, Daishi Yokoyama
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Patent number: 10487243Abstract: The present invention relates to a formulation suitable for the preparation of a highly refractive encapsulation material with good barrier properties towards water vapor for an LED, to an encapsulation material for an LED having a high refractive index and good barrier properties towards water vapor which is obtainable from said formulation and to a light emitting device (LED) comprising said encapsulation material. The formulation comprises a polymer comprising a first repeating unit M1 and a second repeating unit M2; and a surface-modified zirconium dioxide nanocrystal.Type: GrantFiled: July 14, 2017Date of Patent: November 26, 2019Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Ralf Grottenmueller, Abraham Casas Garcia-Minguillan, Fumio Kita, Dieter Wagner, Robert J. Wiacek, Daniel P. Russell, Zehra Serpil Gonen Williams
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Patent number: 10451971Abstract: [Problem] To provide a composition for an underlayer, which can form an underlayer having flattened surface. [Means for Solution] A composition for forming an underlayer, comprising a polymer having a repeating unit containing nitrogen and a solvent. An underlayer is formed by coating this composition on a substrate, preferably baking in an inert atmosphere, and then baking in the air containing oxygen.Type: GrantFiled: February 2, 2016Date of Patent: October 22, 2019Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Masato Suzuki, Yusuke Hama, Hiroshi Yanagita, Go Noya, Shigemasa Nakasugi
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Patent number: 10451974Abstract: The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.Type: GrantFiled: June 19, 2017Date of Patent: October 22, 2019Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Kazuma Yamamoto, Yuriko Matsuura, Tomoyasu Yashima, Tatsuro Nagahara
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Patent number: 10435555Abstract: To provide a composition for gap formation capable of forming sacrifice areas made of a sacrificial material decomposable completely into vapor at a desired temperature, and also to provide a semiconductor device-manufacturing method using the composition. Disclosed is a composition for gap formation comprising a polymer and a solvent: wherein said polymer comprising five or more of repeating units which are represented by at least one kind of the following formula (1) or (2): Ar1-L1??(1) Ar2-L2-Ar2???(2) [each of Ar1, Ar2 and Ar2? is independently a substituted or unsubstituted aromatic group; and each of L1 and L2 is independently oxygen, sulfur, alkyl, sulfone, amide, ketone or a group represented by the following formula (3): {Ar3 is an aromatic group; and L3 is a trivalent atom selected from the group consisting of nitrogen, boron and phosphorus}].Type: GrantFiled: May 26, 2015Date of Patent: October 8, 2019Assignee: AZ Electronic Materials (Luxembourg) S.a.r.lInventors: Shigemasa Nakasugi, Takafumi Kinuta, Go Noya
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Patent number: 10421841Abstract: The present invention relates to a method for producing silazane-siloxa copolymers and the use of such copolymers, particularly in LEDs.Type: GrantFiled: October 4, 2016Date of Patent: September 24, 2019Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Ralf Grottenmüller, Abraham Casas Garcia-Minguillan, Fumio Kita, Dieter Wagner
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Patent number: 10409161Abstract: To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability. The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-generator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.Type: GrantFiled: January 20, 2017Date of Patent: September 10, 2019Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Motoki Misumi, Daishi Yokoyama, Megumi Takahashi, Toshiaki Nonaka