Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

Abstract: The present invention relates to a method for diamond coating of substrates in which the substrate is exposed in a vacuum atmosphere to a reactive gas mixture excited by means of a plasma discharge, the plasma discharge comprising a plasma beam (14) in an evacuated receiver (16) that is formed between a cathode chamber (1) and an anode (2), and the reactive gas mixture comprising a reactive gas and a working gas, the reactive gas in (9) and the working gas in (8) and/or (9) introduced into the receiver, and the receiver (16) is evacuated by a pump arrangement (15), and the hydrogen concentration of the reactive gas mixture being 0–45 vol. %.

Abstract: A planet system workpiece support for a vacuum treatment apparatus includes a sun system rotatable in the vacuum treatment apparatus about a sun system axle to be coupled to a drive. At least one planet system is rotatable on planet axle and is supported on the sun system. The planet system has a driving coupling for driving the planet system and the support has at least one moon system supported on the planet system and rotatable about a moon axle with a driving connection to the sun system. At least one workpiece is received on the moon system and the driving connection is established, at least during operation, uninterruptedly between sun system and moon system.

Abstract: A method and apparatus or configuration generates light of a given polarization state (P). A polarization state-sensitive beam splitter is acted upon by light (L) at an input (E1), light (LP) of the given polarization state being output by the beam splitter (1) at a first beam splitter output (A1). Light (LS) with polarization state (S) that is perpendicular to the given state (P) is changed with respect to this state and also output. The light of the changed polarization state again acts upon the polarization state-sensitive beam splitter at the input (E1). The apparatus or configuration achieves this by having the optic input (E3) of a polarization state-changing structural element whose optic output (A3) is operationally connected to the optic input (E1) of the polarization state-sensitive beam splitter, operationally connected to the second optic output (A2).

Abstract: A method for producing a unit having a three-dimensional surface patterning on a base layer. A photoresist is applied to a base layer and subjected to a masked exposure matched to a predetermined final surface patterning. Parts of the photoresist layer are removed by developing to provide an initial surface patterning, including photoresist sacrificial subregions. A coating which covers the initial surface patterning is then applied. Energy is then applied to the initial surface patterning to destabilize the sacrificial layer regions. The initial surface patterning is acted on by a high-pressure liquid jet at a predetermined treatment temperature such that at least part of the coating which covers the sacrificial layer regions are mechanically removed or at least broken open to produce the final surface patterning. The liquid has a negligible chemical reaction rate and/or physical dissolution rate with respect to materials of the unit and/or organic fluid-sealing means.

Abstract: A spectral light division and recombination configuration and method has an incident face for light to be divided and at least one emergent face for recombined light. A spectrally selective light division system selectively separates light of a first spectral range from light of a second and of a third spectral range left combined. A recombining system recombining light of the first spectral range with light of the second and third spectral ranges are also included and the first spectral range is green light and is spectrally located between the second and the third spectral ranges.

Abstract: A Vacuum transport chamber for disk-shaped substrates, has a base plate structure has an interior surface which borders an interior of the chamber on one side thereof. A covering structure is situated parallel and opposite an interior surface of the base plate structure. The structure has at least two substrate passage openings which are adapted to a substrate disk surface. A transport device which is rotationally drivingly movable about a rotation axis perpendicular to the base plate structure. At least one substrate receiving device is brought into alignment with a respective one of the openings. A controlled sealing arrangement establishes an edge of at least one of the openings with the substrate holding device brought into alignment therewith and a substrate provided thereon.

Abstract: A method for manufacturing an optical device provides at least two sub-bodies of a base body and, at each sub-body, a surface so that the surfaces are complementary to each other and snugly fit on one another. Along at least one of the complementary surfaces, a first optical layer system is defined. The sub-bodies are joined along the complementary surfaces so as to embed the optical layer system between them and thus forming an assembled sub-body. Machining a continuous surface on the assembled sub-body and at a predetermined angle to the complementary surfaces and the embedded layer system then takes place, where the latter abut at the machined continuous surface. A second layer system is then provided along the continuous surface.

Abstract: A waveguide plate and a process for making the waveguide plate with a plate-like glass substrate (1), carrying a waveguiding layer (2), with at least one coupling grating on the surface carrying said waveguiding layer (2), which coupling grating is formed as a grating of lines with a period between 150 nm and 1000 nm, the extension of said grating being at least 5 cm with lines parallel to one another, wherein the coupling angle (?) varies by not more than 0.1°/cm along a line of said grating and wherein the absolute value of the deviation of the coupling angle (?) on said waveguide plate, from a predefined desired value, does not exceed 0.5°. The deviation from the average value of the coupling angle does not exceed 0.3°, preferably not 0.15° on the whole waveguide plate.

Abstract: A waveguide plate and a process for making the waveguide plate with a plate-like glass substrate (1), carrying a waveguiding layer (2), with at least one coupling grating on the surface carrying said waveguiding layer (2), which coupling grating is formed as a grating of lines with a period between 150 nm and 1000 nm, the extension of said grating being at least 5 cm with lines parallel to one another, wherein the coupling angle () varies by not more than 0.1_/cm along a line of said grating and wherein the absolute value of the deviation of the coupling angle () on said waveguide plate, from a predefined desired value, does not exceed 0.5_. The deviation from the average value of the coupling angle does not exceed 0.3_, preferably not 0.15_ on the whole waveguide plate.

Abstract: A switch for the optical switching of a light path, particularly for switching the entering of light into a fiber-optical light guide is provided. The switch dial has at least one mirror surface for reflecting the light and, for establishing the mirror surface, a support is equipped with a reflective layer, which support is constructed as a glass body.

Abstract: A light coupling element is proposed with a surface (3) of a material which is transparent to light of a given wavelength (?). In order for the light coupling element to act independently of the direction of the vectorial parameters of the light, such as in particular of the polarization, on the surface of the light coupling element line-form indentations or elevations (51, 52) are provided which are equidistantly parallel and which intersect at given angles (?).

Abstract: A sputtering chamber system and method uses at least one sputtering source with a new sputter surface at least approximately symmetrical with respect to a central axis. A substrate carrier is arranged to be drivingly rotatable about a substrate carrier axis. The central axis and the substrate carrier axis are oblique with respect to one another, and the sputtering source is a magnetron sputtering source. The new sputter surface is substantially rotationally symmetrical with respect to the central axis, with the central axis and the substrate carrier axis intersecting at least approximately. With respect to an angle ? between the central axis and the substrate carrier axis, 30°???60°, preferably 40°???55°, particularly preferably 43°???50°, particularly ??45°.

Abstract: A process for the vacuum treatment of workpieces, includes loading the workpieces into a treatment facility, surface treating the workpieces in at least one vacuum station of the facility grouped as a station batch and controlling at least the timing of the process by a freely programmable process controller unit. At least two stations operating each on workpiece batches can be grouped as respective station batches and be different with respect to number of workpieces. The workpieces can be transported to and from the grouped stations. An embodiment of vacuum treatment system for such a process includes at least one vacuum treatment station for workpieces grouped as a station batch. A transport system supplies the vacuum station with workpieces. A process controller unit has an output operationally connected to a drive arrangement for the transport system. The unit controls operating timing of the treatment system and is freely programmable.

Abstract: A coupling grating formed as a line grating with a grating period between 100 nm and 2500 nm, a substrate (1) is covered with a photoresist layer (10) and exposed for instance at the Lithrow angle (?L) or at 0° to a mercury-vapour lamp (11) via a folding mirror (13, 13?) through a phase mask (14) in the near field of which the photoresist layer is arranged, then structured by reactive ion etching and provided with a transparent layer by reactive DC magnetron sputtering, particularly pulsed DC sputtering or AC-superimposed DC sputtering. The phase mask (14) is structured in advance with the laser two-beam interference method. The process is particularly suited for the production of optical elements, particularly evane-scent field sensor plates and optical couplers for communications technology which can be employed in particular as filters for wavelength multiplexing in fibre-optic networks.

Abstract: Vacuum treatment installation with a vacuum treatment chamber containing a plasma discharge configuration as well as a gas supply configuration. The plasma discharge configuration has at least two plasma beam discharge configurations with substantially parallel discharge axes and a deposition configuration is positioned along a surface which extends at predetermined distances from the beam axes and along a substantial section of the longitudinal extent of the discharge beam.

Abstract: A vacuum treatment system has a vacuum treatment chamber, with a sensor arrangement to detect the treatment atmosphere momentarily existing in the treatment area. An ACTUAL value sensor of the sensor arrangement for one or more of the elements to establish a treatment atmosphere is a regulating element of a control circuit for the treatment atmosphere in the treatment area. A workpiece carrier is drivably movable in the chamber through the treatment area having the treatment atmosphere. At least one of the elements modulates the treatment atmosphere in the treatment area according to a defined profile as a function of the workpiece carrier position. A process is disclosed for manufacturing workpieces, in which the workpieces are guided to a vacuum treatment area guided by a control. The treatment atmosphere is modulated in the treatment area as a function of workpiece position with the defined profile.

Abstract: There is proposed a tool with a tool body and a wear resistant layer system, which layer system comprises at least one layer of MeX. Me comprises titanium and aluminum and X is nitrogen or carbon. The tool has a tool body of high speed steel (HSS) or of cemented carbide, but it is not a solid carbide end mill and not a solid carbide ball nose mill. In the MeX layer the quotient QI as defined by the ratio of the diffraction intensity I(200) to I(111) assigned respectively to the (200) and (111) plains in the X ray diffraction of the material using ?-2? method is selected to be ?1. Further, the I(200) is at least twenty times larger than the intensity average noise value, both measured with a well-defined equipment and setting thereof.

Abstract: Coating apparatus for disk-shaped workpieces has a transport chamber with a workpiece transport configuration having two linearly driven transport rams connected to a rotational axis. The rams are within shell lines of a rotation body about the axis and are extended/retracted in the same direction as the axis. A workpiece receiver is at the ends of each ram and two operating openings communicate the transport chamber with stations of the apparatus including a coating station. Surface normals of the openings are in the direction of shell lines. A pump with pump opening communicates with the transport chamber and coating station. At least one of the rams has a closure for closing the pump opening and forming a seal therefor.