Abstract: A yellow light emitting device may have a light source and a color converter wherein at most 1% of the total emitted radiant power of the yellow light emitting device is emitted in a wavelength range shorter than 520 nm, as well as the use of the yellow light emitting device.
Type:
Application
Filed:
March 19, 2019
Publication date:
February 25, 2021
Applicants:
BASF SE, BASF Taiwan Ltd.
Inventors:
Hannah Stephanie MANGOLD, Sorin IVANOVICI, Martin KOENEMANN, Siang Fu HONG, Chia Wei TSAI, Yen Te LEE, Wei Cheng CHOU
Abstract: Described are a chemical-mechanical polishing (CMP) composition comprising abrasive particles in the form of organic/inorganic composite particles as well as the use of said composite particles as abrasive particles in a CMP composition and processes for the manufacture of a semiconductor device comprising chemical mechanical polishing of a substrate in the presence said CMP composition.
Type:
Grant
Filed:
July 24, 2015
Date of Patent:
February 26, 2019
Assignees:
ST. LAWRENCE NANOTECHNOLOGY, BASF TAIWAN LTD., BASF CORPORATION